⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13294860 | 0.95 | NAAA (0.41) | — | |
| SCHEMBL11633352 | 0.88 | NAAA (0.48) | — | |
| SCHEMBL15316797 | 0.83 | CYP1A2 (0.44) | — | |
| Ethyl Propionate SCHEMBL2900869 | 0.83 | GAA (0.57) | — | |
| SCHEMBL681192 | 0.82 | NAAA (0.52) | — | |
| SCHEMBL28891515 | 0.81 | — | — | |
| SCHEMBL1470218 | 0.80 | ALDH1A1 (0.58) | — | |
| Ethyl Propionate SCHEMBL4883389 | 0.79 | — | — | |
| Methane SCHEMBL6300031 | 0.79 | NAAA (0.50) | — | |
| Ethyl Propionate SCHEMBL1332690 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10663863-B2 | Method of producing layer structure, and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2020-05-26 | — | — | US | claimed |
| US-10312074-B2 | Method of producing layer structure, layer structure, and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2019-06-04 | — | — | US | claimed |
| US-20170115572-A1 | METHOD OF PRODUCING LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2017-04-27 | — | — | US | claimed |
| US-20160126088-A1 | METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2016-05-05 | — | — | US | claimed |
| US-20260133489-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-05-14 | — | — | US | disclosed |
| US-20260063996-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-03-05 | — | — | US | disclosed |
| US-20260062515-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER, AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-03-05 | — | — | US | disclosed |
| US-20260003271-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER, AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-01-01 | — | — | US | disclosed |
| US-20250355355-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, DISPLAY DEVICE, AND MANUFACTURING METHOD OF PHOTOSENSITIVE RESIN LAYER | SAMSUNG SDI CO LTD (KR) | 2025-11-20 | — | — | US | disclosed |
| US-20250355352-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, DISPLAY DEVICE, AND MANUFACTURING METHOD OF PHOTOSENSITIVE RESIN LAYER | SAMSUNG SDI CO LTD (KR) | 2025-11-20 | — | — | US | disclosed |
| US-20250355351-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, DISPLAY DEVICE, AND MANUFACTURING METHOD OF PHOTOSENSITIVE RESIN LAYER | SAMSUNG SDI CO LTD (KR) | 2025-11-20 | — | — | US | disclosed |
| US-20250291248-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2025-09-18 | — | — | US | disclosed |
| US-20080081268-A1 | COLORED CURABLE COMPOSITION, COLOR FILTER AND PRODUCTION METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| EP-1847878-A1 | PHOTOSENSITIVE COMPOSITION REMOVING LIQUID | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2007-10-24 | — | — | EP | disclosed |
| US-20060177767-A1 | Photosensitive resin composition, thin film panel including a layer made from photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO., LTD. | 2006-08-10 | — | — | US | disclosed |
| EP-1101761-B1 | Process for producing 3-phenyluracil compounds | SUMITOMO CHEMICAL CO (JP) | 2005-08-17 | — | — | EP | disclosed |
| US-6410484-B1 | ACTIVE MATERIAL; CONTROLLING WEEDS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6339155-B1 | Process for producing 3-phenyluracil compounds | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-15 | — | — | US | disclosed |
| EP-1101761-A2 | Process for producing 3-phenyluracil compounds | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-05-23 | — | — | EP | disclosed |
| EP-1095935-A1 | 6-Hydroxy-5,6-dihydrouracils as herbicides | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-05-02 | — | — | EP | disclosed |