SCHEMBL448045

SCHEMBL448045

CCCCOCCC(=O)OCC

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.50
CYP1A2 P05177 1/20 0.50
TSHR P16473 4/20 0.46
ALDH1A1 P00352 2/20 0.45
GAA P10253 2/20 0.44
MGAM O43451 1/20 0.44
SI P14410 1/20 0.44
MGAM2 Q2M2H8 1/20 0.44
ATM Q13315 1/20 0.42
DNM1 Q05193 1/20 0.42
TRPA1 O75762 1/20 0.41
PAM P19021 2/20 0.41
NAAA Q02083 1/20 0.41
CYP3A4 P08684 1/20 0.41
NR1I2 O75469 1/20 0.41
PGR P06401 1/20 0.41
ADORA3 P0DMS8 1/20 0.41
PTGS2 P35354 1/20 0.41
PDE4D Q08499 1/20 0.41
HTR2C P28335 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7886826 0.94 DGKA (0.50) DGKACYP1A2TSHRALDH1A1GAA
SCHEMBL26813064 0.94 DGKA (0.53) DGKACYP1A2TSHRGAAMGAM
SCHEMBL7627156 0.92 DGKA (0.57) DGKACYP1A2TSHRALDH1A1DNM1
SCHEMBL15478668 0.92 DGKA (0.55) DGKACYP1A2TSHRALDH1A1GAA
SCHEMBL17908715 0.90 DGKA (0.53) DGKACYP1A2TSHRALDH1A1GAA
SCHEMBL17909038 0.90 DGKA (0.53) DGKACYP1A2TSHRALDH1A1GAA
SCHEMBL17909089 0.90 DGKA (0.53) DGKACYP1A2TSHRALDH1A1GAA
SCHEMBL15478676 0.90 DGKA (0.59) DGKACYP1A2TSHRALDH1A1ATM
SCHEMBL446057 0.89 DGKA (0.57) DGKATSHRALDH1A1ATMDNM1
SCHEMBL6817948 0.89 GAA (0.55) DGKACYP1A2TSHRALDH1A1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 678 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250270481-A1 THINNER COMPOSITION DONGWOO FINE-CHEM CO., LTD. (KR) 2025-08-28 US claimed
CN-119156377-A UV light stabilizer 巴斯夫欧洲公司 2024-12-17 CN claimed
CN-118742541-A Ultraviolet light absorber 巴斯夫欧洲公司 2024-10-01 CN claimed
CN-104536265-A Photoresist composition ZHEJIANG YONGTAI TECHNOLOGY CO LTD 2015-04-22 CN claimed
CN-103857751-A Composition for preparing alignment layer, alignment layer prepared therefrom, and retardation film DONGWOO FINE CHEM CO LTD 2014-06-11 CN claimed
CN-100429248-C Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD DONGJIN SAEMIGUNG CO LTD (KR) 2008-10-29 CN claimed
CN-101059653-A Photosensitive resin composition DONGJIN SEMICHEM CO LTD (KR) 2007-10-24 CN claimed
CN-1693322-A Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD DONGJIN SAEMIGUNG CO LTD (KR) 2005-11-09 CN claimed
US-12637529-B2 Resin composition and display device using the same SAMSUNG DISPLAY CO., LTD. (KR) 2026-05-26 US disclosed
US-20250270481-A1 THINNER COMPOSITION DONGWOO FINE-CHEM CO., LTD. (KR) 2025-08-28 US disclosed
US-20250230356-A1 THINNER COMPOSITION DONGWOO FINE-CHEM CO., LTD. (KR) 2025-07-17 US disclosed
CN-112947012-B Photosensitive resin and thinner composition for removing antireflection film, and photosensitive resin and method for removing antireflection film using same 东友精细化工有限公司 2025-04-11 CN disclosed
WO-2025071108-A1 RESIN COMPOSITION FOR ANTI-REFLECTIVE FILM, ANTI-REFLECTIVE FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2025-04-03 WO disclosed
CN-119156377-A UV light stabilizer 巴斯夫欧洲公司 2024-12-17 CN disclosed
US-20010044075-A1 Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element JSR CORPORATION (JP) 2001-11-22 US disclosed
EP-1150165-A1 Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element JSR Corporation (JP) 2001-10-31 EP disclosed
EP-1057859-A2 Radiation sensitive resin composition and use of the same in an interlaminar insulating film JSR Corporation (JP) 2000-12-06 EP disclosed
EP-0562819-B1 Resist coating composition JSR CORP (JP) 1999-12-01 EP disclosed
EP-0908780-A1 Process for forming a cured film of a thermosetting resin JSR Corporation (JP) 1999-04-14 EP disclosed
EP-0562819-A2 Resist coating composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-09-29 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12637529-B2 Resin composition and display device using the same JMJD6, ALKBH2, ARID2 DGKA 3299/4885CYP1A2 571/4885TSHR 3217/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.