Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 6/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.36 |
| ▸ | PKM | P14618 | 1/20 | 0.36 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.36 |
| ▸ | PTPN7 | P35236 | 1/20 | 0.36 |
| ▸ | BLM | P54132 | 1/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.35 |
| ▸ | MAPT | P10636 | 4/20 | 0.35 |
| ▸ | MEN1 | O00255 | 4/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.33 |
| ▸ | HPGD | P15428 | 3/20 | 0.33 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | APAF1 | O14727 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1262626 | 0.80 | KMT2A (0.32) | POLBKMT2APKMPTPN1PTPN7 | |
| SCHEMBL19419087 | 0.75 | KMT2A (0.40) | POLBKMT2APKMPTPN1PTPN7 | |
| SCHEMBL12626508 | 0.73 | ALOX5 (0.40) | POLBKMT2APKMPTPN1PTPN7 | |
| SCHEMBL12705970 | 0.73 | ALOX5 (0.40) | POLBKMT2APKMPTPN1PTPN7 | |
| SCHEMBL12779618 | 0.72 | ALOX5 (0.42) | POLBKMT2APKMPTPN1PTPN7 | |
| SCHEMBL14453316 | 0.71 | ALOX5 (0.39) | POLBKMT2APKMPTPN1PTPN7 | |
| SCHEMBL20721295 | 0.71 | ALOX5 (0.39) | POLBKMT2APKMPTPN1PTPN7 | |
| SCHEMBL1925252 | 0.71 | KMT2A (0.47) | POLBKMT2APKMPTPN1PTPN7 | |
| SCHEMBL12569545 | 0.71 | ALOX5 (0.39) | POLBKMT2APKMPTPN1PTPN7 | |
| SCHEMBL9296215 | 0.71 | ALDH1A1 (0.40) | POLBKMT2APKMPTPN1PTPN7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 186 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9659771-B2 | Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning | APPLIED MATERIALS, INC. (US) | 2017-05-23 | — | — | US | claimed |
| US-20160365248-A1 | CONFORMAL STRIPPABLE CARBON FILM FOR LINE-EDGE-ROUGHNESS REDUCTION FOR ADVANCED PATTERNING | APPLIED MATERIALS, INC. | 2016-12-15 | — | — | US | claimed |
| WO-2011146212-A2 | ULTRA HIGH SELECTIVITY ASHABLE HARD MASK FILM | APPLIED MATERIALS, INC. (US) | 2011-11-24 | — | — | WO | claimed |
| US-20110287633-A1 | ULTRA HIGH SELECTIVITY ASHABLE HARD MASK FILM | APPLIED MATERIALS, INC. (US) | 2011-11-24 | — | — | US | claimed |
| CN-101407909-A | Methods for high temperature deposition of an amorphous carbon layer | APPLIED MATERIALS INC (US) | 2009-04-15 | — | — | CN | claimed |
| US-20090093128-A1 | METHODS FOR HIGH TEMPERATURE DEPOSITION OF AN AMORPHOUS CARBON LAYER | APPLIED MATERIALS, INC. | 2009-04-09 | — | — | US | claimed |
| US-7399697-B2 | Very low dielectric constant plasma-enhanced CVD films | APPLIED MATERIALS, INC. (US) | 2008-07-15 | — | — | US | claimed |
| US-20070275569-A1 | METHODS AND APPARATUS FOR E-BEAM TREATMENT USED TO FABRICATE INTEGRATED CIRCUIT DEVICES | APPLIED MATERIALS, INC. | 2007-11-29 | — | — | US | claimed |
| US-6914014-B2 | Method for curing low dielectric constant film using direct current bias | APPLIED MATERIALS, INC. (US) | 2005-07-05 | — | — | US | claimed |
| US-20050136240-A1 | Very low dielectric constant plasma-enhanced CVD films | MANDAL ROBERT P (US) | 2005-06-23 | — | — | US | claimed |
| US-6797643-B2 | Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power | APPLIED MATERIALS INC. | 2004-09-28 | — | — | US | claimed |
| WO-2004063422-A2 | METHOD FOR CURING LOW DIELECTRIC CONSTANT FILM USING DIRECT CURRENT BIAS | APPLIED MATERIALS, INC. (US) | 2004-07-29 | — | — | WO | claimed |
| US-20040137758-A1 | METHOD FOR CURING LOW DIELECTRIC CONSTANT FILM USING DIRECT CURRENT BIAS | APPLIED MATERIALS,INC. | 2004-07-15 | — | — | US | claimed |
| US-20040101632-A1 | Method for curing low dielectric constant film by electron beam | APPLIED MATERIALS, INC. | 2004-05-27 | — | — | US | claimed |
| US-20040082193-A1 | PLASMA ENHANCED CVD LOW K CARBON-DOPED SILICON OXIDE FILM DEPOSITION USING VHF-RF POWER | APPLIED MATERIALS, INC | 2004-04-29 | — | — | US | claimed |
| US-20030232495-A1 | Methods and apparatus for E-beam treatment used to fabricate integrated circuit devices | APPLIED MATERIALS, INC. | 2003-12-18 | — | — | US | claimed |
| US-20030194495-A1 | Crosslink cyclo-siloxane compound with linear bridging group to form ultra low k dielectric | APPLIED MATERIALS, INC. | 2003-10-16 | — | — | US | claimed |
| US-20030194496-A1 | Methods for depositing dielectric material | APPLIED MATERIALS, INC. | 2003-10-16 | — | — | US | claimed |
| US-20030186000-A1 | Hardness improvement of silicon carboxy films | APPLIED MATERIALS, INC. | 2003-10-02 | — | — | US | claimed |
| US-20020142585-A1 | Very low dielectric constant plasma-enhanced CVD films | APPLIED MATERIALS, INC. | 2002-10-03 | — | — | US | claimed |