SCHEMBL448874

SCHEMBL448874

CCC(=O)OCCCOC

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.61
HTT P42858 1/20 0.44
ALDH1A1 P00352 3/20 0.41
DGKA P23743 1/20 0.40
GAA P10253 1/20 0.39
RAD52 P43351 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
TSHR P16473 1/20 0.38
FAAH O00519 1/20 0.37
DNM1 Q05193 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
ATM Q13315 1/20 0.37
POLB P06746 1/20 0.37
CYP1A2 P05177 1/20 0.36
HPGD P15428 1/20 0.36
CYP2C19 P33261 1/20 0.36
BLM P54132 1/20 0.36
WRN Q14191 1/20 0.36
HIF1A Q16665 1/20 0.36
HTR2C P28335 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17453519 0.95 NAAA (0.68) NAAAHTTALDH1A1DGKAGAA
SCHEMBL2600809 0.90 NAAA (0.73) NAAAHTTALDH1A1DGKAGAA
SCHEMBL28100216 0.87 NAAA (0.63) NAAAHTTALDH1A1DGKARAD52
SCHEMBL181426 0.85
SCHEMBL50185 0.85 NAAA (0.81) NAAAHTTALDH1A1DGKAGAA
SCHEMBL16917384 0.83 MGAM (0.46) NAAAALDH1A1DGKAGAATSHR
Hydrochloric Acid SCHEMBL29367851 0.83 NAAA (0.52) NAAAHTTALDH1A1DGKAGAA
SCHEMBL28312766 0.83 NAAA (0.64) NAAAHTTALDH1A1DGKAGAA
SCHEMBL27869299 0.83 ADRA2A (0.50) NAAAALDH1A1DGKATSHRDNM1
Ammonia Solution, Strong SCHEMBL27732610 0.83 NAAA (0.52) NAAAHTTALDH1A1DGKAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10663863-B2 Method of producing layer structure, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2020-05-26 US claimed
US-10312074-B2 Method of producing layer structure, layer structure, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2019-06-04 US claimed
US-20170115572-A1 METHOD OF PRODUCING LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2017-04-27 US claimed
US-20160126088-A1 METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2016-05-05 US claimed
EP-2652832-A1 BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION Dow Global Technologies LLC (US) 2013-10-23 EP claimed
WO-2012082760-A1 BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION DOW GLOBAL TECHNOLOGIES LLC (US) 2012-06-21 WO claimed
WO-2024203156-A1 LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2024-10-03 WO disclosed
WO-2024158178-A1 THERMOSETTING RESIN COMPOSITION, CURED FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2024-08-02 WO disclosed
WO-2024147537-A1 RESIN COMPOSITION FOR ANTI-REFLECTION FILM, ANTI-REFLECTION FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2024-07-11 WO disclosed
CN-112731765-B Fluorine-containing resin composition, preparation method thereof and preparation method of cured film containing fluorine-containing resin composition 西安瑞联新材料股份有限公司 2024-03-26 CN disclosed
CN-117511567-A Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element 日产化学株式会社 2024-02-06 CN disclosed
CN-111133373-B Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element using same 日产化学株式会社 2023-02-28 CN disclosed
CN-115605517-A Compound, (co) polymer, composition, resist pattern forming method, and method for producing compound and (co) polymer 三菱瓦斯化学株式会社(JP) 2023-01-13 CN disclosed
EP-1508835-A2 Dye-containing resist composition and color filter using same NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) 2005-02-23 EP disclosed
US-6531635-B1 Hydrolyzing and hydrogenating a reaction mixture of 1,1,3-trialkoxyalkane and 3-alkoxyalkanal obtained from reaction of an alpha,beta-unsaturated aldehyde with an alcohol; 3-methoxypropanol from acrolein and methanol IDEMITSU PETROCHEMICALS CO., LTD. (JP) 2003-03-11 US disclosed
EP-1179519-A1 PRECURSORS OF 3-ALKOXYALKANOLS AND PROCESSES FOR THE PREPARATION OF 3-ALKOXYALKANOLS IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2002-02-13 EP disclosed
US-4699998-A Process for the preparation of glycol derivatives BP CHEMICALS LIMITED (GB) 1987-10-13 US disclosed
US-4681941-A Method of preparing esters of aryloxyphenoxy propanoic acid THE DOW CHEMICAL COMPANY (US) 1987-07-21 US disclosed
EP-0140545-B1 PROCESS FOR THE PREPARATION OF GLYCOL DERIVATIVES BP Chemicals Limited (GB) 1987-04-29 EP disclosed
EP-0140545-A1 Process for the preparation of glycol derivatives BP Chemicals Limited (GB) 1985-05-08 EP disclosed