SCHEMBL449847

SCHEMBL449847

CCC(C=C(C)C(=O)O)N=C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3166697 1.00
SCHEMBL451026 0.86 CHRM1 (0.32)
SCHEMBL448596 0.84 CA2 (0.35)
SCHEMBL448243 0.83 MAPT (0.40)
SCHEMBL445918 0.82 MAPT (0.42)
SCHEMBL9860622 0.76
SCHEMBL15429 0.75
SCHEMBL16353948 0.71
SCHEMBL16353946 0.71
SCHEMBL74358 0.71 GRIK1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2307190-B1 SILICONE-CONTAINING POLYMERIC MATERALS WITH HYDROLYZABLE GROUPS NOVARTIS AG (CH) 2015-03-18 EP disclosed
US-8883928-B2 Silicone-containing polymeric materials with hydrolyzable groups NOVARTIS AG (CH) 2014-11-11 US disclosed
US-20120065331-A1 SILICONE-CONTAINING POLYMERIC MATERIALS WITH HYDROLYZABLE GROUPS ALCON INC. (CH) 2012-03-15 US disclosed
US-8079703-B2 Silicone-containing polymeric materials with hydrolyzable groups NOVARTIS AG (CH) 2011-12-20 US disclosed
EP-2307190-A1 SILICONE-CONTAINING POLYMERIC MATERALS WITH HYDROLYZABLE GROUPS Novartis AG (CH) 2011-04-13 EP disclosed
WO-2010011493-A1 SILICONE-CONTAINING POLYMERIC MATERALS WITH HYDROLYZABLE GROUPS NOVARTIS AG (CH) 2010-01-28 WO disclosed
US-20100014047-A1 Silicone-Containing Polymeric Materials with Hydrolyzable Groups ALCON INC. (CH) 2010-01-21 US disclosed
EP-1563991-B1 Image recording material FUJIFILM CORP (JP) 2007-05-23 EP disclosed
EP-1182033-B1 Image recording material FUJI PHOTO FILM CO LTD (JP) 2006-11-22 EP disclosed
US-7105276-B2 Image recording material FUJI PHOTO FILM CO., LTD. (JP) 2006-09-12 US disclosed
US-20050187103-A1 Image recording material FUJI PHOTO FILM CO., LTD. (JP) 2005-08-25 US disclosed
EP-1563991-A1 Image recording material FUJI PHOTO FILM CO., LTD. (JP) 2005-08-17 EP disclosed
US-6916595-B2 Image recording material FUJI PHOTO FILM CO., LTD. (JP) 2005-07-12 US disclosed
US-20030008239-A1 Image recording material FUJIFILM CORPORATION (JP) 2003-01-09 US disclosed
EP-1182033-A1 Image recording material FUJI PHOTO FILM CO., LTD. (JP) 2002-02-27 EP disclosed
US-4587204-A PHOTORESISTS, POLYSILOXANE-POLYAMIDES GENERAL ELECTRIC COMPANY (US) 1986-05-06 US disclosed
US-4515887-A MODIFIED WITH ISOCYANATOALKYL ACRYLATE GENERAL ELECTRIC COMPANY (US) 1985-05-07 US disclosed