Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL3679371 | 0.87 | — | — | |
| Hydrochloric Acid SCHEMBL3679373 | 0.87 | — | — | |
| Hydrochloric Acid SCHEMBL439297 | 0.85 | — | — | |
| Hydrochloric Acid SCHEMBL451619 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL438646 | 0.73 | — | — | |
| Hydrochloric Acid SCHEMBL440215 | 0.73 | PDE5A (0.30) | — | |
| Hydrochloric Acid SCHEMBL437014 | 0.69 | CES2 (0.31) | — | |
| Hydrochloric Acid SCHEMBL452565 | 0.68 | — | — | |
| Hydrochloric Acid SCHEMBL9066179 | 0.68 | — | — | |
| Hydrochloric Acid SCHEMBL452650 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120061626-A1 | PASTE COMPOSITION USED FOR FORMING AN ELECTRODE OR WIRING WHICH IS CURABLE AT A LOW TEMPERATURE | DONGJIN SEMICHEM CO., LTD (KR) | 2012-03-15 | — | — | US | claimed |
| EP-2416328-A2 | LOW TEMPERATURE FIREABLE PASTE COMPOSITION FOR FORMING AN ELECTRODE OR WIRING | Dongjin Semichem Co., Ltd. (KR) | 2012-02-08 | — | — | EP | claimed |
| CN-104781353-B | Fluorophor ink composite and preparation method thereof | 金喜俊 | 2017-03-15 | — | — | CN | disclosed |
| CN-104781353-A | Fluorescent ink composition, and preparation method therefor | KIM HEE-JOON | 2015-07-15 | — | — | CN | disclosed |
| US-8841396-B2 | Ethylene-α-olefin copolymer and molded article | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-09-23 | — | — | US | disclosed |
| US-8809462-B2 | Ethylene-α-olefin copolymer, molded article, catalyst for copolymerization, and method for producing an ethylene-α-olefin copolymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20130005930-A1 | ETHYLENE-alpha-OLEFIN COPOLYMER AND MOLDED ARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20120061626-A1 | PASTE COMPOSITION USED FOR FORMING AN ELECTRODE OR WIRING WHICH IS CURABLE AT A LOW TEMPERATURE | DONGJIN SEMICHEM CO., LTD (KR) | 2012-03-15 | — | — | US | disclosed |
| US-20120065346-A1 | ETHYLENE-ALPHA-OLEFIN COPOLYMER, MOLDED ARTICLE, CATALYST FOR COPOLYMERIZATION, AND METHOD FOR PRODUCING AN ETHYLENE-ALPHA-OLEFIN COPOLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-15 | — | — | US | disclosed |
| EP-2416328-A2 | LOW TEMPERATURE FIREABLE PASTE COMPOSITION FOR FORMING AN ELECTRODE OR WIRING | Dongjin Semichem Co., Ltd. (KR) | 2012-02-08 | — | — | EP | disclosed |
| US-7678866-B2 | Polyethylene composition and process for producing same | TOSOH CORPORATION (JP) | 2010-03-16 | — | — | US | disclosed |
| EP-1473323-A1 | Polyethylene composition and process for producing same | Tosoh Corporation (JP) | 2004-11-03 | — | — | EP | disclosed |
| US-20040214953-A1 | Polyethylene composition and process for producing same | TOSOH CORPORATION | 2004-10-28 | — | — | US | disclosed |
| US-6680404-B1 | CONDENSING ACYCLIC ESTERS WITH OXY ALDEHYDES IN THE PRESENCE OF GROUP I COMPOUNDS, THEN DISTILLING THE ALCOHOLS AND COLLECTING OXY UNSATURATED CARBOCYCLIC ESTERS FORMED USED AS SUNSCREEN AGENTS | SYMRISE GMBH & CO. KG (DE) | 2004-01-20 | — | — | US | disclosed |