SCHEMBL450655

SCHEMBL450655

CC(C)(C)c1ccccc1[SiH](Cl)Cl

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.44
ALDH1A1 P00352 1/20 0.44
TSHR P16473 1/20 0.44
CA2 P00918 1/20 0.41
GABRA1 P14867 1/20 0.35
GABRB2 P47870 1/20 0.35
KIF11 P52732 1/20 0.34
ALOX12 P18054 2/20 0.33
POLB P06746 1/20 0.33
GAA P10253 1/20 0.33
THRB P10828 1/20 0.33
RXRA P19793 1/20 0.31
RXRB P28702 1/20 0.31
RXRG P48443 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
GRIN2D O15399 1/20 0.30
GRIN3B O60391 1/20 0.30
GRIN1 Q05586 1/20 0.30
GRIN2A Q12879 1/20 0.30
GRIN2B Q13224 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2101737 0.79 ALDH1A1 (0.39) TDP1ALDH1A1TSHRCA2GABRA1
SCHEMBL2102692 0.79 ALDH1A1 (0.39) TDP1ALDH1A1TSHRCA2GABRA1
SCHEMBL10630514 0.79 ALDH1A1 (0.41) ALDH1A1TSHR
SCHEMBL988385 0.78 ALDH1A1 (0.46) TDP1ALDH1A1TSHRCA2GABRA1
SCHEMBL17138351 0.76 TDP1 (0.44) TDP1ALDH1A1TSHRCA2GABRA1
SCHEMBL272815 0.76 ALDH1A1 (0.50) TDP1ALDH1A1TSHRCA2GABRA1
SCHEMBL3298464 0.74 ALDH1A1 (0.43) TDP1ALDH1A1TSHRCA2GABRA1
SCHEMBL2102754 0.74 ALDH1A1 (0.35) TDP1ALDH1A1TSHRCA2
SCHEMBL2100793 0.74 ALDH1A1 (0.35) TDP1ALDH1A1TSHRCA2ALOX12
SCHEMBL5000032 0.73 TDP1 (0.41) TDP1ALDH1A1TSHRCA2GABRA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 160 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130153263-A1 INORGANIC NANOFILLER, PARTIAL DISCHARGE RESISTANT ENAMELED WIRE INCLUDING THE SAME, AND PREPARING METHOD OF THE ENAMELED WIRE SEJONG UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION (KR) 2013-06-20 US claimed
EP-1546250-B1 ORGANOSILICON COMPOUNDS AND BLENDS FOR TREATING SILICA DOW CORNING (US) 2007-12-19 EP claimed
CN-1305948-C Organosilicon compounds and blends for treating silica DOW CORNING (US) 2007-03-21 CN claimed
CN-1681880-A Organosilicon compounds and blends for treating silica DOW CORNING (US) 2005-10-12 CN claimed
EP-1546250-A2 ORGANOSILICON COMPOUNDS AND BLENDS FOR TREATING SILICA Dow Corning Corporation (US) 2005-06-29 EP claimed
WO-2004024812-A2 ORGANOSILICON COMPOUNDS AND BLENDS FOR TREATING SILICA DOW CORNING CORPORATION (US) 2004-03-25 WO claimed
US-12109812-B2 Ink jet printing method and ink jet printing apparatus SEIKO EPSON CORPORATION (JP) 2024-10-08 US disclosed
CN-114055975-B Ink jet recording method and ink jet recording apparatus 精工爱普生株式会社 2023-05-12 CN disclosed
US-20220032618-A1 Ink Jet Printing Method And Ink Jet Printing Apparatus SEIKO EPSON CORPORATION (JP) 2022-02-03 US disclosed
CN-104974184-B preparation of silazane Compounds 信越化学工业株式会社 2019-12-06 CN disclosed
CN-110191889-A Silsesquioxane derivative, its composition and low cure shrinkage cured film with free-radical polymerised functional group 捷恩智株式会社 2019-08-30 CN disclosed
US-10259208-B2 Three-dimensional shaped object manufacturing device, method for manufacturing three-dimensional shaped object, and three-dimensional shaped object SEIKO EPSON CORPORATION (JP) 2019-04-16 US disclosed
US-9956726-B2 Apparatus for producing three-dimensional structure, method of producing three-dimensional structure, and three-dimensional structure SEIKO EPSON CORPORATION (JP) 2018-05-01 US disclosed
US-5017453-A Integrated circuits KABUSHIKI KAISHA TOSHIBA (JP) 1991-05-21 US disclosed
US-4923719-A ORGANOFLUOROSILANE ALLIED-SIGNAL INC. (US) 1990-05-08 US disclosed
WO-1990002107-A1 A METHOD OF COATING SILICON CARBIDE FIBERS ALLIED-SIGNAL INC. (US) 1990-03-08 WO disclosed
US-4822716-A FINE PATTERN SEMICONDUCTOR, INTEGRATED CIRCUIT KABUSHIKI KAISHA TOSHIBA (JP) 1989-04-18 US disclosed
EP-0231497-A1 Silicone resist materials containing polysiloxanes KABUSHIKI KAISHA TOSHIBA (JP) 1987-08-12 EP disclosed
US-4491669-A Mixed alkoxyaminosilanes, methods of making same and vulcanizing silicons prepared therefrom PETRARCH SYSTEMS INC. (US) 1985-01-01 US disclosed
US-4307212-A Curable epoxy resins GENERAL ELECTRIC COMPANY (US) 1981-12-22 US disclosed