SCHEMBL451229

SCHEMBL451229

CC(=O)OC(C)=O.CC(=O)OC(C)=O.CC(C)O[Ti]OC(C)C

nearest known ligand 0.53

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.53
ALDH1A1 P00352 2/20 0.53
HSD17B10 Q99714 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
HCAR2 Q8TDS4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetone SCHEMBL27692966 0.86 TSHR (0.43) TSHRALDH1A1TDP1
Acetone SCHEMBL27862164 0.86 TSHR (0.43) TSHRALDH1A1TDP1
Acetic Acid SCHEMBL16110537 0.83 FFAR3 (0.41) TSHRHCAR2
SCHEMBL4580100 0.81 MGAM (0.41) TSHRALDH1A1
SCHEMBL5481448 0.80 ALDH1A1 (0.32) TSHRALDH1A1HSD17B10
SCHEMBL1142681 0.79 TSHR (0.38) TSHR
SCHEMBL398895 0.77 MGAM (0.40) TSHRALDH1A1TDP1
Propionic Acid SCHEMBL7105059 0.77 FFAR3 (0.50) TSHRALDH1A1TDP1
SCHEMBL215101 0.76
Methacrylic Acid SCHEMBL1359934 0.75 TSHR (0.40) TSHRALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2980835-B1 COMPOSITE SHEET FOR FORMING PROTECTIVE FILM LINTEC CORP (JP) 2020-12-02 EP disclosed
US-10030174-B2 Composite sheet for forming protective film LINTEC CORPORATION (JP) 2018-07-24 US disclosed
US-20160046840-A1 COMPOSITE SHEET FOR FORMING PROTECTIVE FILM LINTEC CORPORATION (JP) 2016-02-18 US disclosed
EP-2980835-A1 COMPOSITE SHEET FOR FORMING PROTECTIVE FILM LINTEC Corporation (JP) 2016-02-03 EP disclosed
US-9126178-B2 Heat-expandable microspheres and a method of making heat-expandable microspheres and application thereof MATSUMOTO YUSHI-SEIYAKU CO., LTD. (JP) 2015-09-08 US disclosed
EP-2529830-A2 Heat-expandable microspheres and a method of making heat-expandable microspheres and application thereof MATSUMOTO YUSHI-SEIYAKU CO., LTD. (JP) 2012-12-05 EP disclosed
EP-2441814-A1 HEAT-EXPANDABLE MICROSPHERE, METHOD FOR PRODUCING SAME AND USE OF SAME Matsumoto Yushi-Seiyaku Co., Ltd. (JP) 2012-04-18 EP disclosed
US-20120064347-A1 HEAT-EXPANDABLE MICROSPHERES AND A METHOD OF MAKING HEAT-EXPANDABLE MICROSPHERES AND APPLICATION THEREOF MATSUMOTO YUSHI-SEIYAKU CO., LTD. (JP) 2012-03-15 US disclosed
US-8029855-B2 Fine inorganic oxide dispersion, coating composition, optical film, antireflection film, polarizing plate and image display device FUJIFILM CORPORATION (JP) 2011-10-04 US disclosed
US-7846511-B2 Transparent film and method for manufacturing the same, polarized plate and image display device FUJIFILM CORPORATION (JP) 2010-12-07 US disclosed
US-20050154086-A1 Fine inorganic oxide dispersion, coating composition, optical film, antireflection film, polarizing plate, and image display device FUJI PHOTO FILM CO., LTD. (JP) 2005-07-14 US disclosed
EP-1505122-A1 CURABLE SILICONE COMPOSITION FOR THE PRODUCTION OF COMPOSITE SOFT MAGNETIC MATERIALS, AND COMPOSITE SOFT MAGNETIC MATERIALS Dow Corning Toray Silicone Co., Ltd. (JP) 2005-02-09 EP disclosed
US-20040219380-A1 Sol-gel method; applying solution containing metal alkoxide and polymer having a hydrogen bond-forming group on film and radiating with electromagnetic waves to form gas barrier layer; durability, accuracy FUJI PHOTO FILM CO., LTD. 2004-11-04 US disclosed
US-20040209090-A1 Gas barrier laminate film and method for producing same FUJI PHOTO FILM CO., LTD. 2004-10-21 US disclosed
US-20040177982-A1 Image display having electromagnetic shield and method for producing same FUJI PHOTO FILM CO., LTD. 2004-09-16 US disclosed
US-20040116555-A1 Polymer composition containing organic modified layered silicate, film and gas barrier film as well as substrate and image display device using them FUJI PHOTO FILM CO., LTD. 2004-06-17 US disclosed
US-6716946-B2 Coating SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-04-06 US disclosed
US-20040058157-A1 Gas barrier film FUJI PHOTO FILM CO., LTD. 2004-03-25 US disclosed
US-20030004269-A1 Acrylated resins; high strength, heat resistance SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-01-02 US disclosed
EP-1264870-A1 Coating Shin-Etsu Chemical Co., Ltd. (JP) 2002-12-11 EP disclosed