SCHEMBL4580100

SCHEMBL4580100

CC(=O)CC(=O)OC(C)=O.CC(=O)CC(=O)OC(C)=O.CC(C)O[Ti]OC(C)C

nearest known ligand 0.41

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
MGAM O43451 1/20 0.41
GAA P10253 1/20 0.41
SI P14410 1/20 0.41
MGAM2 Q2M2H8 1/20 0.41
TSHR P16473 2/20 0.33
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28374616 0.84 MGAM (0.62) MGAMGAASIMGAM2TSHR
SCHEMBL1277958 0.84 MGAM (0.62) MGAMGAASIMGAM2TSHR
SCHEMBL9064427 0.83 MGAM (0.40) MGAMGAASIMGAM2TSHR
SCHEMBL398895 0.83 MGAM (0.40) MGAMGAASIMGAM2TSHR
SCHEMBL451229 0.81 TSHR (0.53) TSHRALDH1A1
SCHEMBL28224529 0.81 MGAM (0.60) MGAMGAASIMGAM2TSHR
SCHEMBL586203 0.81 MGAM (0.60) MGAMGAASIMGAM2TSHR
SCHEMBL15847228 0.81 MGAM (0.60) MGAMGAASIMGAM2TSHR
SCHEMBL9280063 0.81 MGAM (0.60) MGAMGAASIMGAM2TSHR
SCHEMBL28370473 0.79 GAA (0.50) MGAMGAASIMGAM2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110317263-A1 ANTIREFLECTION FILM, POLARIZING PLATE AND IMAGE DISPLAY UTILIZING THE SAME FUJIFILM CORPORATION (JP) 2011-12-29 US disclosed
US-20080088925-A1 Antireflection Film, Polarizing Plate And Image Display Utilizing The Same FUJIFILM CORPORATION (JP) 2008-04-17 US disclosed
WO-2006016542-A1 ANTIREFLECTION FILM, POLARIZING PLATE AND IMAGE DISPLAY UTILIZING THE SAME FUJIFILM CORPORATION (JP) 2006-02-16 WO disclosed
US-6111044-A CONTAINS A RESIN HAVING AT LEAST ONE FUNCTIONAL GROUP SELECTED FROM THE GROUP CONSISTING OF A BLOCKED HYDROXYL GROUP, BLOCKED CARBOXYLIC ACID, AND AN EPOXY GROUP NOF CORPORATION (JP) 2000-08-29 US disclosed