⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14401879 | 0.65 | — | — | |
| SCHEMBL10841160 | 0.64 | — | — | |
| SCHEMBL4777163 | 0.64 | — | — | |
| SCHEMBL7556195 | 0.63 | CHRNB2 (0.33) | — | |
| SCHEMBL11184521 | 0.63 | — | — | |
| SCHEMBL355207 | 0.62 | — | — | |
| SCHEMBL10069952 | 0.61 | — | — | |
| SCHEMBL4508362 | 0.61 | — | — | |
| SCHEMBL27479914 | 0.60 | CA2 (0.44) | — | |
| SCHEMBL9273727 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7518003-B2 | Production process of tetrahydropyran compound and tetrahydropyran compound produced by the production process | SHOWA DENKO K.K. (JP) | 2009-04-14 | — | — | US | disclosed |
| US-20080139828-A1 | Reacting 3,4-dihydro-2-alkoxy-2H-pyran with hydrogen in the presence of a catalyst under acidic condition; Grignard reaction solvent or polymer solvent | SHOWA DENKO K.K. (JP) | 2008-06-12 | — | — | US | disclosed |
| EP-1828158-A1 | PRODUCTION PROCESS OF TETRAHYDROPYRAN COMPOUND AND TETRAHYDROPYRAN COMPOUND PRODUCED BY THE PRODUCTION PROCESS | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2007-09-05 | — | — | EP | disclosed |
| WO-2006062211-A1 | PRODUCTION PROCESS OF TETRAHYDROPYRAN COMPOUND AND TETRAHYDROPYRAN COMPOUND PRODUCED BY THE PRODUCTION PROCESS | SHOWA DENKO K.K. (JP) | 2006-06-15 | — | — | WO | disclosed |