Methacrylic Acid

Methacrylic Acid

SCHEMBL4515900

C1=CC2CC1C1OC21.C=C(C)C(=O)O

nearest known ligand 0.35

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Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.35
APEX1 P27695 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
ALDH1A1 P00352 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
KMT2A Q03164 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL5886130 0.74 POLB (0.39) POLBAPEX1TDP1ALDH1A1SMN1; SMN2
Adamantane SCHEMBL21924976 0.68 TDP1 (0.38) TDP1ALDH1A1L3MBTL1
Methacrylic Acid SCHEMBL775263 0.68 TDP1 (0.38) POLBTDP1ALDH1A1SMN1; SMN2KMT2A
Adamantane SCHEMBL22115918 0.68 TDP1 (0.38) TDP1ALDH1A1L3MBTL1
Adamantane SCHEMBL131439 0.68 TDP1 (0.38) TDP1ALDH1A1L3MBTL1
Methacrylic Acid SCHEMBL27668012 0.68 TDP1 (0.38) TDP1ALDH1A1
Methacrylic Acid SCHEMBL20873030 0.67 POLB (0.33) POLBAPEX1TDP1
Methacrylic Acid SCHEMBL3426195 0.67 TDP1 (0.47) TDP1ALDH1A1SMN1; SMN2
Methacrylic Acid SCHEMBL225835 0.67 TDP1 (0.47) TDP1ALDH1A1SMN1; SMN2
Methacrylic Acid SCHEMBL3858692 0.67 TDP1 (0.47) TDP1ALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090181171-A1 Method of Controlling Orientation of Domains in Block Copolymer Films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-07-16 US claimed
US-9828518-B2 Copolymer formulations, methods of manufacture thereof and articles comprising the same DOW GLOBAL TECHNOLOGIES LLC (US) 2017-11-28 US disclosed
US-20150195916-A1 FORMATION OF A COMPOSITE PATTERN INCLUDING A PERIODIC PATTERN SELF-ALIGNED TO A PREPATTERN INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-07-09 US disclosed
US-20150184017-A1 COPOLYMER FORMULATIONS, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2015-07-02 US disclosed
US-20130209755-A1 SELF-ASSEMBLED STRUCTURES, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC 2013-08-15 US disclosed
US-8491965-B2 Method of controlling orientation of domains in block copolymer films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-07-23 US disclosed
US-20090181171-A1 Method of Controlling Orientation of Domains in Block Copolymer Films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-07-16 US disclosed