Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.33 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.33 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.33 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.33 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.33 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.33 |
| ▸ | LCK | P06239 | 1/20 | 0.33 |
| ▸ | FYN | P06241 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Adamantane SCHEMBL21924976 | 1.00 | TDP1 (0.38) | TDP1HSD11B1TSHRMAPTALDH1A1 | |
| Adamantane SCHEMBL22115918 | 1.00 | TDP1 (0.38) | TDP1HSD11B1TSHRMAPTALDH1A1 | |
| Methacrylic Acid SCHEMBL4167447 | 0.89 | TDP1 (0.35) | TDP1HSD11B1ALDH1A1FFAR3LCK | |
| Methacrylic Acid SCHEMBL479571 | 0.89 | TDP1 (0.35) | TDP1HSD11B1TSHRALDH1A1CHRNB2 | |
| Methacrylic Acid SCHEMBL2833953 | 0.89 | TDP1 (0.35) | TDP1HSD11B1TSHRALDH1A1CHRNB2 | |
| Methacrylic Acid SCHEMBL2965962 | 0.86 | HSD11B1 (0.39) | HSD11B1MAPTCYP2C9EPHX2L3MBTL1 | |
| Adamantan-2-Ol SCHEMBL5405211 | 0.86 | CYP2C9 (0.56) | HSD11B1MAPTCYP2C9EPHX2L3MBTL1 | |
| Methacrylic Acid SCHEMBL5879020 | 0.85 | LMNA (0.32) | TDP1TSHR | |
| Methacrylic Acid SCHEMBL6865018 | 0.84 | HSD11B1 (0.38) | TDP1HSD11B1MAPTCYP2C9EPHX2 | |
| Methacrylic Acid SCHEMBL12802644 | 0.83 | EPHX2 (0.38) | TSHRALDH1A1CYP2C9EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 791 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120004734-A | Synthesis method of adamantane methacrylate | 成都东凯芯半导体材料有限公司 | 2025-05-16 | — | — | CN | claimed |
| CN-117800842-A | Synthesis method of adamantane methacrylate resin monomer containing carboxyl | 西安瑞联新材料股份有限公司 | 2024-04-02 | — | — | CN | claimed |
| CN-114763394-B | Nonionic hyperbranched hydrophobically associating polyacrylamide thickener and preparation method thereof | 中国石油天然气股份有限公司 | 2024-03-01 | — | — | CN | claimed |
| US-11732077-B2 | Resin composition, adhesive member, and display device | SAMSUNG DISPLAY CO., LTD. (KR) | 2023-08-22 | — | — | US | claimed |
| CN-112323623-B | Steel bridge deck pavement structure and pavement process thereof | 江苏绿迈环境技术有限公司 | 2022-03-25 | — | — | CN | claimed |
| CN-113980540-A | Preparation method and application of adamantane modified self-repairing epoxy water-based acrylic coating | 深圳市酷斯顿贸易有限公司 | 2022-01-28 | — | — | CN | claimed |
| CN-112011295-B | High-temperature-resistant acrylate pressure-sensitive adhesive and preparation method thereof | 永一胶粘(中山)有限公司 | 2021-09-17 | — | — | CN | claimed |
| CN-112679653-B | Photoresist film-forming resin and preparation method of photoresist composition thereof | 甘肃华隆芯材料科技有限公司 | 2021-09-14 | — | — | CN | claimed |
| CN-113150222-A | Fast-curing friction-resistant epoxy acrylic resin and preparation method thereof | 中科院广州化学有限公司 | 2021-07-23 | — | — | CN | claimed |
| CN-112799280-A | Application of nitrobenzyl alcohol sulfonate compound as accelerator in photoresist and composition for preparing photoresist | 北京科华微电子材料有限公司 | 2021-05-14 | — | — | CN | claimed |
| CN-112011295-A | High-temperature-resistant acrylate pressure-sensitive adhesive and preparation method thereof | 永一胶粘(中山)有限公司 | 2020-12-01 | — | — | CN | claimed |
| CN-104874031-B | Polyurethane derivative for simulating human fibrinolytic system and vascular endothelial system, preparation method and preparation method of related product | 苏州大学 | 2017-10-10 | — | — | CN | claimed |
| US-8993649-B2 | Pressure-sensitive adhesive for polarizing plates, pressure-sensitive adhesive sheet, polarizing plate with pressure-sensitive adhesive and production process for the same and optical film and production process for the same | LINTEC CORPORATION (JP) | 2015-03-31 | — | — | US | claimed |
| US-8174130-B2 | Laser dicing sheet and manufacturing method for chip body | LINTEC CORPORATION (JP) | 2012-05-08 | — | — | US | claimed |
| US-7786225-B2 | Curable resin composition | DIC CORPORATION (JP) | 2010-08-31 | — | — | US | claimed |
| US-6617086-B2 | Providing on substrate a layer of a negative photoresist comprising a polymer having methacrylate recurring groups; imagewise exposing layer to irradiation; developing photoresist by removing portions of layer not exposed | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-09-09 | — | — | US | claimed |
| US-20020123010-A1 | Forming a pattern of a negative photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2002-09-05 | — | — | US | claimed |
| EP-0869998-B1 | RADIATION-HARDENABLE COATINGS | BASF AG (DE) | 2002-05-08 | — | — | EP | claimed |
| US-6251569-B1 | ACRYLATED ESTER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-06-26 | — | — | US | claimed |
| US-6106905-A | POLYMERS OF ACRYLIC ACID, ESTERS, AMIDES WITH METHANOINDENE DERIVATIVES FOR POWDER COATINGS | BASF LACKE + FARBEN AKTIENGESELLSCHAFT (DE) | 2000-08-22 | — | — | US | claimed |