Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 15/20 | 0.77 |
| ▸ | RECQL | P46063 | 2/20 | 0.77 |
| ▸ | NPC1 | O15118 | 2/20 | 0.70 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.70 |
| ▸ | RAB9A | P51151 | 2/20 | 0.70 |
| ▸ | MEN1 | O00255 | 1/20 | 0.65 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.65 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.58 |
| ▸ | TP53 | P04637 | 1/20 | 0.58 |
| ▸ | HPGD | P15428 | 1/20 | 0.58 |
| ▸ | TSHR | P16473 | 1/20 | 0.58 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.58 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.58 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.58 |
| ▸ | MAPT | P10636 | 1/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29609513 | 0.98 | HSD11B1 (0.74) | HSD11B1RECQLNPC1ALDH1A1RAB9A | |
| SCHEMBL29236675 | 0.93 | HSD11B1 (0.73) | HSD11B1RECQLNPC1ALDH1A1RAB9A | |
| SCHEMBL4966036 | 0.89 | RECQL (0.73) | HSD11B1RECQLNPC1ALDH1A1RAB9A | |
| SCHEMBL28392708 | 0.89 | RECQL (0.73) | HSD11B1RECQLNPC1ALDH1A1RAB9A | |
| SCHEMBL16660516 | 0.89 | HSD11B1 (0.73) | HSD11B1RECQLNPC1ALDH1A1RAB9A | |
| SCHEMBL6202982 | 0.87 | HSD11B1 (1.00) | HSD11B1RECQLNPC1ALDH1A1RAB9A | |
| SCHEMBL6278347 | 0.87 | HSD11B1 (0.71) | HSD11B1RECQLNPC1ALDH1A1RAB9A | |
| SCHEMBL10931021 | 0.87 | HSD11B1 (1.00) | HSD11B1RECQLNPC1ALDH1A1RAB9A | |
| SCHEMBL6201887 | 0.87 | HSD11B1 (0.87) | HSD11B1RECQLNPC1ALDH1A1RAB9A | |
| SCHEMBL28888270 | 0.87 | HSD11B1 (1.00) | HSD11B1RECQLNPC1ALDH1A1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 822 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116769741-B | Fusion protein composition and synthesis method of double-enzyme immobilized PHA microsphere and beta-hydroxy sulfone | 河北牧群生物科技有限公司 | 2024-06-18 | — | — | CN | claimed |
| CN-118136828-A | Synergistic regulation and control method for cathode and anode ion states on surface of high nickel oxide cathode | 北京科技大学 | 2024-06-04 | — | — | CN | claimed |
| CN-116769741-A | Fusion protein composition and synthesis method of double-enzyme immobilized PHA microsphere and beta-hydroxy sulfone | 河北牧群生物科技有限公司 | 2023-09-19 | — | — | CN | claimed |
| CN-116217395-A | Preparation method of beta-carbonyl compound | 黄淮学院 | 2023-06-06 | — | — | CN | claimed |
| CN-109400654-B | Iridium complex with 2- (benzenesulfonyl) acetophenone derivative as auxiliary ligand | 云南师范大学 | 2022-05-24 | — | — | CN | claimed |
| US-20100119835-A1 | PHOTOCURABLE COMPOSITIONS FOR PREPARING ABS-LIKE ARTICLES | HUNTSMAN INTERNATIONAL LLC (US) | 2010-05-13 | — | — | US | claimed |
| US-7090958-B2 | Positive photoresist compositions having enhanced processing time | PPG INDUSTRIES OHIO, INC. (US) | 2006-08-15 | — | — | US | claimed |
| WO-2004092837-A2 | POSITIVE PHOTORESIST COMPOSITIONS HAVING ENHANCED PROCESSING TIME | PPG INDUSTRIES OHIO, INC. (US) | 2004-10-28 | — | — | WO | claimed |
| US-20040202953-A1 | Positive photoresist compositions having enhanced processing time | PPG INDUSTRIES OHIO, INC. | 2004-10-14 | — | — | US | claimed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | claimed |
| US-5637440-A | HYDROLYSIS OF AN ORGANOMETALLIC COMPOUND UNDER THE EFFECT OF RADIATION | MITSUBISHI MATERIALS CORPORATION (JP) | 1997-06-10 | — | — | US | claimed |
| JP-60071603-A | — | — | None | — | — | JP | disclosed |
| JP-60070444-A | — | — | None | — | — | JP | disclosed |
| US-12393115-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2025-08-19 | — | — | US | disclosed |
| CN-118930487-A | 1,3, 5-Trisubstituted pyrazole compound and preparation method thereof | 赣南师范大学 | 2024-11-12 | — | — | CN | disclosed |
| JP-S6071603-A | PHOTOPOLYMERIZABLE COMPOSITION | DAICEL CHEM IND LTD | 1985-04-23 | — | — | JP | disclosed |
| JP-S6070444-A | NONSILVER SALT TYPE PHOTOSENSITIVE MATERIAL | DAICEL CHEM IND LTD | 1985-04-22 | — | — | JP | disclosed |
| US-4469891-A | Substituted-cyclopropyl sulfones | NATIONAL DISTILLERS AND CHEMICAL CORPORATION (US) | 1984-09-04 | — | — | US | disclosed |
| US-4446077-A | Substituted-cyclopropyl sulfones | NATIONAL DISTILLERS AND CHEMICAL CORPORATION (US) | 1984-05-01 | — | — | US | disclosed |
| EP-0005380-B1 | PHOTOTROPIC PHOTOSENSITIVE COMPOSITIONS CONTAINING A FLUORAN COLORFORMER | Dynachem Corporation (US) | 1982-01-06 | — | — | EP | disclosed |