SCHEMBL4529907

SCHEMBL4529907

CC(=CN)C(=O)OC(C)(C)C

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
DGAT1 O75907 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28465051 0.80 DGAT1 (0.36) DGAT1
SCHEMBL28557899 0.80 DGAT1 (0.36) DGAT1
SCHEMBL7692060 0.80 DGAT1 (0.36) DGAT1
SCHEMBL3680404 0.80 DGAT1 (0.36) DGAT1
Hydrochloric Acid SCHEMBL11324560 0.79 GABRR1 (0.30)
SCHEMBL27925918 0.78 DGAT1 (0.34) DGAT1
SCHEMBL11649025 0.78 DGAT1 (0.34) DGAT1
SCHEMBL1537760 0.77
SCHEMBL21296285 0.76 DGAT1 (0.33) DGAT1
SCHEMBL8907908 0.76 DGAT1 (0.33) DGAT1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109401511-A A kind of self-cleaning external wall of building water paint and preparation method 成都新柯力化工科技有限公司 2019-03-01 CN claimed
US-20070269747-A1 Lithography Technique Using Silicone Molds DOW CORNING CORPORATION 2007-11-22 US claimed
EP-1803033-A2 LITHOGRAPHY TECHNIQUE USING SILICONE MOLDS Dow Corning Corporation (US) 2007-07-04 EP claimed
WO-2006031455-A2 LITHOGRAPHY TECHNIQUE USING SILICONE MOLDS DOW CORNING CORPORATION (US) 2006-03-23 WO claimed
CN-109401511-A A kind of self-cleaning external wall of building water paint and preparation method 成都新柯力化工科技有限公司 2019-03-01 CN disclosed
US-20140154420-A1 PARTIALLY FLUORINATED COPOLYMERS E I DU PONT DE NEMOURS AND COMPANY (US) 2014-06-05 US disclosed
US-20090102089-A1 Epoxy Formulations for Use in Lithography Techniques DOW CORNING CORPORATION 2009-04-23 US disclosed
EP-1976900-A1 EPOXY FORMULATIONS FOR USE IN LITHOGRAPHY TECHNIQUES Dow Corning Corporation (US) 2008-10-08 EP disclosed
US-20070269747-A1 Lithography Technique Using Silicone Molds DOW CORNING CORPORATION 2007-11-22 US disclosed
WO-2007087399-A1 EPOXY FORMULATIONS FOR USE IN LITHOGRAPHY TECHNIQUES DOW CORNING CORPORATION (US) 2007-08-02 WO disclosed
EP-1803033-A2 LITHOGRAPHY TECHNIQUE USING SILICONE MOLDS Dow Corning Corporation (US) 2007-07-04 EP disclosed
WO-2006031455-A2 LITHOGRAPHY TECHNIQUE USING SILICONE MOLDS DOW CORNING CORPORATION (US) 2006-03-23 WO disclosed
CN-1051991-C Glutaric acid derivatives and preparation thereof PFIZER (US) 2000-05-03 CN disclosed
CN-1107135-A Glutaric acid derivatives and preparation thereof PFIZER (US) 1995-08-23 CN disclosed
CN-1028361-C Process for the preparation of glutaric acid derivatives PFIZER (US) 1995-05-10 CN disclosed
CN-1051725-A Glutaric acid derivatives and process for preparing the same PFIZER (US) 1991-05-29 CN disclosed