SCHEMBL4544302

SCHEMBL4544302

C=C(C)C(=O)OC1(C)C(C)CCCC1C

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.35
ALOX15 P16050 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13383380 0.79
SCHEMBL20382236 0.79 ALDH1A1 (0.38) ALDH1A1
SCHEMBL18068519 0.79 ALDH1A1 (0.33) ALDH1A1
SCHEMBL7719678 0.79 ALOX15 (0.35) ALDH1A1ALOX15
SCHEMBL10627034 0.77 ALOX15 (0.34) ALDH1A1ALOX15
SCHEMBL18068536 0.77 ALDH1A1 (0.32) ALDH1A1
SCHEMBL13713818 0.77 ALDH1A1 (0.34) ALDH1A1
SCHEMBL1834271 0.77 ALDH1A1 (0.34) ALDH1A1ALOX15
SCHEMBL29117789 0.77
SCHEMBL18068511 0.76 ALDH1A1 (0.31) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8168366-B2 Low activation energy photoresist composition and process for its use INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-05-01 US disclosed
US-8168366-B2 Low activation energy photoresist composition and process for its use INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-05-01 US disclosed
US-7476492-B2 Low activation energy photoresist composition and process for its use INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-01-13 US disclosed
US-7476492-B2 Low activation energy photoresist composition and process for its use INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-01-13 US disclosed
US-20070275324-A1 Low activation energy photoresist composition and process for its use GLOBALFOUNDRIES U.S. INC. 2007-11-29 US disclosed
US-20070275324-A1 Low activation energy photoresist composition and process for its use GLOBALFOUNDRIES U.S. INC. 2007-11-29 US disclosed