⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL566590 | 0.97 | NQO1 (0.35) | — | |
| SCHEMBL566435 | 0.97 | — | — | |
| SCHEMBL11581914 | 0.97 | NQO1 (0.35) | — | |
| SCHEMBL5150076 | 0.97 | NQO1 (0.35) | — | |
| SCHEMBL2906412 | 0.94 | — | — | |
| SCHEMBL497751 | 0.87 | — | — | |
| SCHEMBL11848680 | 0.77 | — | — | |
| SCHEMBL7074061 | 0.75 | ALDH1A1 (0.33) | — | |
| SCHEMBL19458923 | 0.75 | — | — | |
| SCHEMBL2899477 | 0.75 | KDM4E (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 179 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7300741-B2 | For printing features having a dimension of about 30 nm or less; resist is developable in an aqueous alkaline developer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-27 | — | — | US | claimed |
| US-20070269736-A1 | NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-22 | — | — | US | claimed |
| US-20070248908-A1 | ADVANCED CHEMICALLY AMPLIFIED RESIST FOR SUB 30NM DENSE FEATURE RESOLUTION | INTERNATIONAL BUSINESS MACHINES (US) | 2007-10-25 | — | — | US | claimed |
| US-20050106494-A1 | Silicon-containing resist systems with cyclic ketal protecting groups | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-05-19 | — | — | US | claimed |
| US-20040121399-A1 | Substrate bound linker molecules for the construction of biomolecule microarrays | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-06-24 | — | — | US | claimed |
| US-6268436-B1 | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-07-31 | — | — | US | claimed |
| US-6210856-B1 | Resist composition and process of forming a patterned resist layer on a substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-04-03 | — | — | US | claimed |
| US-6103447-A | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2000-08-15 | — | — | US | claimed |
| US-6043003-A | SOME OF THE POLAR FUNCTIONAL GROUPS OF THE AQUEOUS BASE SOLUBLE POLYMER OR COPOLYMERS ARE PROTECTED WITH A CYCLIC ALIPHATIC KETAL PROTECTING GROUP SUCH AS METHOXYCYCLOHEXANYL. | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-03-28 | — | — | US | claimed |
| US-6037097-A | A CYCLIC ALIPHATIC KETAL SUBSTITUENT E.G. METHOXYCYCLOHEXANYL AS AN ACID-LABILE PROTECTING GROUP FOR AN AQUEOUS BASE SOLUBLE POLYMER, E.G. A POLYHYDROXYSTYRENE; SHELF-LIFE; VACUUM STABILITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-03-14 | — | — | US | claimed |
| EP-0932082-A2 | Chemically amplified resist composition and method of creating a patterned resist using electron beam | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-07-28 | — | — | EP | claimed |
| CN-111864271-B | Electrolyte additive for lithium secondary battery, electrolyte for lithium secondary battery, and lithium secondary battery including electrolyte | 三星SDI株式会社 | 2024-03-29 | — | — | CN | disclosed |
| CN-111403809-B | Additive for lithium secondary battery, electrolyte and lithium secondary battery comprising same | 三星SDI株式会社 | 2023-08-18 | — | — | CN | disclosed |
| US-11728513-B2 | Elecrolyte additive for lithium secondary battery, electrolyte for lithium secondary battery, and lithium secondary battery including electrolyte | SAMSUNG SDI CO., LTD. (KR) | 2023-08-15 | — | — | US | disclosed |
| CN-111584934-B | Lithium secondary battery | 三星SDI株式会社 | 2023-08-04 | — | — | CN | disclosed |
| EP-0495751-A1 | Bisacylphosphines | CIBA-GEIGY AG (CH) | 1992-07-22 | — | — | EP | disclosed |
| EP-0301907-B1 | NOVEL SUBSTITUTED ANTHRASTEROID DERIVATES, THEIR PRODUCTION AND USE | SHIONOGI SEIYAKU KABUSHIKI KAISHA trading under the name of SHIONOGI & CO. LTD. (JP) | 1991-04-17 | — | — | EP | disclosed |
| US-4874898-A | ANTIANDROGENS | SHIONOGI AND CO., LTD. PATENT DEPARTMENT (JP) | 1989-10-17 | — | — | US | disclosed |
| EP-0301907-A1 | Novel substituted anthrasteroid derivates, their production and use | SHIONOGI SEIYAKU KABUSHIKI KAISHA trading under the name of SHIONOGI & CO. LTD. (JP) | 1989-02-01 | — | — | EP | disclosed |
| US-3971825-A | (5,6) (10,11) BIS-METHYLENE, BRONCHODILATORS | SANKYO COMPANY LIMITED (JA) | 1976-07-27 | — | — | US | disclosed |