Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 2/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | GRM5 | P41594 | 4/20 | 0.31 |
| ▸ | GRM1 | Q13255 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2016537 | 0.98 | KDM4E (0.38) | KDM4ELMNAEPHX2TDP1ALDH1A1 | |
| SCHEMBL21215002 | 0.82 | KDM4E (0.35) | KDM4ELMNAEPHX2TDP1ALDH1A1 | |
| SCHEMBL9317589 | 0.81 | KDM4E (0.38) | KDM4ELMNAEPHX2TDP1ALDH1A1 | |
| SCHEMBL16705159 | 0.77 | KDM4E (0.35) | KDM4ELMNAEPHX2TDP1ALDH1A1 | |
| SCHEMBL2458229 | 0.77 | KDM4E (0.35) | KDM4ELMNAEPHX2TDP1ALDH1A1 | |
| SCHEMBL2014878 | 0.77 | KDM4E (0.35) | KDM4ELMNAEPHX2TDP1ALDH1A1 | |
| SCHEMBL2016534 | 0.76 | KDM4E (0.34) | KDM4ELMNAEPHX2ALDH1A1PKM | |
| SCHEMBL3994061 | 0.72 | KDM4E (0.37) | KDM4ELMNAEPHX2TDP1ALDH1A1 | |
| SCHEMBL10526491 | 0.72 | KDM4E (0.32) | KDM4ELMNA | |
| SCHEMBL2020231 | 0.72 | KDM4E (0.34) | KDM4ELMNAALDH1A1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027908-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027908-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| CN-106987154-B | Method for producing dye-dissolved liquid, colored curable resin composition containing the dye-dissolved liquid, color filter, and display device | 东友精细化工有限公司 | 2023-09-05 | — | — | CN | disclosed |
| US-9436093-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-09-06 | — | — | US | disclosed |
| US-9436093-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-09-06 | — | — | US | disclosed |
| US-20160124312-A1 | PATTERN FORMING PROCESS AND SHRINK AGENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-05 | — | — | US | disclosed |
| US-20160124312-A1 | PATTERN FORMING PROCESS AND SHRINK AGENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-05 | — | — | US | disclosed |
| US-9170487-B2 | Resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-27 | — | — | US | disclosed |
| US-9152042-B2 | Acrylic ester derivative, high-molecular compound and photoresist composition | KURARAY CO., LTD. (JP) | 2015-10-06 | — | — | US | disclosed |
| US-20130260312-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20130230802-A1 | ACRYLAMIDE DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2013-09-05 | — | — | US | disclosed |
| US-20130164675-A1 | ACRYLIC ESTER DERIVATIVE, HIGH-MOLECULAR COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2013-06-27 | — | — | US | disclosed |
| US-8168349-B2 | Fuel cell-purpose electrolyte material and production method therefor | TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) | 2012-05-01 | — | — | US | disclosed |
| US-8168349-B2 | Fuel cell-purpose electrolyte material and production method therefor | TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) | 2012-05-01 | — | — | US | disclosed |
| US-20090136819-A1 | Fuel Cell-Purpose Electrolyte Material and Production Method Therefor | TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) | 2009-05-28 | — | — | US | disclosed |
| US-20090136819-A1 | Fuel Cell-Purpose Electrolyte Material and Production Method Therefor | TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) | 2009-05-28 | — | — | US | disclosed |
| WO-2007096747-A1 | FUEL CELL-PURPOSE ELECTROLYTE MATERIAL AND PRODUCTION METHOD THEREFOR | TOYOTA JIDOSHA KABUSHIKI KAISHA (DE) | 2007-08-30 | — | — | WO | disclosed |