⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10320223 | 0.81 | — | — | |
| SCHEMBL28298931 | 0.78 | — | — | |
| SCHEMBL12501955 | 0.76 | — | — | |
| SCHEMBL15053179 | 0.76 | — | — | |
| SCHEMBL5409120 | 0.72 | — | — | |
| SCHEMBL15233001 | 0.69 | — | — | |
| SCHEMBL10325369 | 0.67 | — | — | |
| SCHEMBL25738179 | 0.65 | KCNA4 (0.33) | — | |
| SCHEMBL3973408 | 0.65 | — | — | |
| SCHEMBL6119389 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 426 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119528691-A | Preparation method of 3, 3-trifluoro-2- (trifluoromethyl) propane-1, 2-diol | 三明市海斯福化工有限责任公司 | 2025-02-28 | — | — | CN | claimed |
| US-20240429449-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH ELECTROLYTE CONTAINING A BENZOYL PEROXIDE BASED COMPOUND | ENEVATE CORPORATION | 2024-12-26 | — | — | US | claimed |
| CN-119143571-A | Hexafluoroisopropyl preparation method of butene | 绿菱电子材料（天津）有限公司 | 2024-12-17 | — | — | CN | claimed |
| US-11884776-B2 | Compounds | MEXICHEM FLUOR S.A. DE C.V. (MX) | 2024-01-30 | — | — | US | claimed |
| US-11710854-B2 | Functional epoxides in catalyst-based electrolyte compositions for Li-ion batteries | ENEVATE CORPORATION (US) | 2023-07-25 | — | — | US | claimed |
| US-20230151150-A1 | COMPOUNDS | MEXICHEM FLUOR S.A. DE C.V. (MX) | 2023-05-18 | — | — | US | claimed |
| US-11603433-B2 | Compounds | MEXICHEM FLUOR S.A. DE C.V. (MX) | 2023-03-14 | — | — | US | claimed |
| US-11462769-B2 | Silicon-based energy storage devices with electrolyte containing a benzoyl peroxide based compound | ENEVATE CORPORATION (US) | 2022-10-04 | — | — | US | claimed |
| WO-2022093797-A1 | FUNCTIONAL EPOXIDES IN CATALYST-BASED ELECTROLYTE COMPOSITIONS FOR LI-ION BATTERIES | ENEVATE CORPORATION (US) | 2022-05-05 | — | — | WO | claimed |
| US-20220140392-A1 | FUNCTIONAL EPOXIDES IN CATALYST-BASED ELECTROLYTE COMPOSITIONS FOR LI-ION BATTERIES | ENEVATE CORPORATION | 2022-05-05 | — | — | US | claimed |
| US-7227041-B2 | Process for preparing a phosphinoalkanol | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-06-05 | — | — | US | claimed |
| US-6951705-B2 | Polymers for photoresist compositions for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2005-10-04 | — | — | US | claimed |
| US-20050186447-A1 | Electroluminescent iridium compounds with phosphinoalkoxides and phenylpyridines or phenylpyrimidines and devices made with such compounds | GRUSHIN VLADIMIR (US) | 2005-08-25 | — | — | US | claimed |
| JP-2005518081-A | — | — | 2005-06-16 | — | — | JP | claimed |
| EP-1472909-A1 | ELECTROLUMINESCENT IRIDIUM COMPOUNDS WITH PHOSPHINOALKOXIDES AND PHENYLPYRIDINES OR PHENYLPYRIMIDINES AND DEVICES MADE WITH SUCH COMPOUNDS | E.I. du Pont de Nemours and Company (US) | 2004-11-03 | — | — | EP | claimed |
| US-20030211417-A1 | Polymers for photoresist compositions for microlithography | DUPONT ELECTRONICS, INC. | 2003-11-13 | — | — | US | claimed |
| US-20030173896-A1 | Electroluminescent iridium compounds with phosphinoalkoxides and phenylpyridines or phenylpyrimidines and devices made with such compounds | LG CHEM, LTD. (KR) | 2003-09-18 | — | — | US | claimed |
| WO-2003069961-A1 | ELECTROLUMINESCENT IRIDIUM COMPOUNDS WITH PHOSPHINOALKOXIDES AND PHENYLPYRIDINES OR PHENYLPYRIMIDINES AND DEVICES MADE WITH SUCH COMPOUNDS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2003-08-21 | — | — | WO | claimed |
| EP-1279069-A2 | POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2003-01-29 | — | — | EP | claimed |
| WO-2001086352-A2 | POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2001-11-15 | — | — | WO | claimed |