⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14046810 | 0.83 | — | — | |
| SCHEMBL454976 | 0.72 | — | — | |
| SCHEMBL15053179 | 0.71 | — | — | |
| SCHEMBL21919199 | 0.69 | — | — | |
| SCHEMBL24653609 | 0.69 | — | — | |
| SCHEMBL14749872 | 0.67 | — | — | |
| SCHEMBL21919187 | 0.65 | — | — | |
| SCHEMBL9465401 | 0.65 | — | — | |
| SCHEMBL21919198 | 0.64 | — | — | |
| SCHEMBL10001288 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7166416-B2 | Protecting groups in polymers, photoresists and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-01-23 | — | — | US | disclosed |
| US-7166416-B2 | Protecting groups in polymers, photoresists and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-01-23 | — | — | US | disclosed |
| US-20050191579-A1 | Protecting groups in polymers, photoresists and processes for microlithography | FEIRING ANDREW E (US) | 2005-09-01 | — | — | US | disclosed |
| US-6899995-B2 | Protecting groups in polymers, photoresists and processes for microlithography | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2005-05-31 | — | — | US | disclosed |
| US-20040023157-A1 | Protecting groups in polymers, photoresists and processes for microlithography | E.I. DU PONT DE NEMOURS AND COMPANY | 2004-02-05 | — | — | US | disclosed |
| EP-1340125-A2 | PROTECTING GROUPS IN POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2003-09-03 | — | — | EP | disclosed |
| WO-2002044845-A2 | PROTECTING GROUPS IN POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-06-06 | — | — | WO | disclosed |