Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | ACHE | P22303 | 6/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.32 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.32 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9700524 | 1.00 | LMNA (0.36) | LMNAMEN1KMT2AALDH1A1HSD17B10 | |
| SCHEMBL920169 | 1.00 | LMNA (0.36) | LMNAMEN1KMT2AALDH1A1HSD17B10 | |
| SCHEMBL926290 | 1.00 | LMNA (0.36) | LMNAMEN1KMT2AALDH1A1HSD17B10 | |
| SCHEMBL19812440 | 0.97 | SMN1; SMN2 (0.33) | LMNAMEN1KMT2AALDH1A1HSD17B10 | |
| SCHEMBL140974 | 0.88 | TSHR (0.32) | MEN1KMT2AALDH1A1TSHR | |
| Hydrochloric Acid SCHEMBL29110397 | 0.85 | TSHR (0.30) | TSHR | |
| Ammonia Solution, Strong SCHEMBL17077299 | 0.85 | TSHR (0.30) | TSHR | |
| Sulfuric Acid SCHEMBL27153894 | 0.85 | GAA (0.31) | GAA | |
| SCHEMBL8195166 | 0.80 | LMNA (0.35) | LMNAMEN1KMT2AALDH1A1HSD17B10 | |
| Boric Acid SCHEMBL720200 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11732217-B2 | Cleaning solution composition and cleaning method using the same | KCTECH CO., LTD. (KR) | 2023-08-22 | — | — | US | claimed |
| US-20220025299-A1 | CLEANING SOLUTION COMPOSITION AND CLEANING METHOD USING THE SAME | KCTECH CO., LTD. (KR) | 2022-01-27 | — | — | US | claimed |
| CN-113969215-A | Cleaning liquid composition and cleaning method using same | 凯斯科技股份有限公司 | 2022-01-25 | — | — | CN | claimed |
| US-12038691-B2 | Method for producing substrate with patterned film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12038692-B2 | Method for producing substrate with patterned film and fluorine-containing copolymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-11732217-B2 | Cleaning solution composition and cleaning method using the same | KCTECH CO., LTD. (KR) | 2023-08-22 | — | — | US | disclosed |
| US-20220025299-A1 | CLEANING SOLUTION COMPOSITION AND CLEANING METHOD USING THE SAME | KCTECH CO., LTD. (KR) | 2022-01-27 | — | — | US | disclosed |
| CN-113969215-A | Cleaning liquid composition and cleaning method using same | 凯斯科技股份有限公司 | 2022-01-25 | — | — | CN | disclosed |
| US-20210317245-A1 | METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CONTAINING COPOLYMER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2021-10-14 | — | — | US | disclosed |
| US-20210200099-A1 | METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM | CENTRAL GLASS COMPANY, LIMITED (JP) | 2021-07-01 | — | — | US | disclosed |
| US-20200089116-A1 | Fluorine-Containing Monomer, Fluorine-Containing Polymer, Pattern Forming Composition Using Same, and Pattern Forming Method of Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2020-03-19 | — | — | US | disclosed |
| US-4863842-A | Silver halide photographic light sensitive material | KONICA TECHNOSEARCH CORPORATION (JP) | 1989-09-05 | — | — | US | disclosed |
| US-4752561-A | Light-sensitive silver halide photographic material incorporating metal complex with high quenching constant and an oil soluble dye | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1988-06-21 | — | — | US | disclosed |
| EP-0137271-B1 | METHOD OF IMPROVING THE LIGHT RESISTANCE OF A DYE IMAGE | KONICA CORPORATION (JP) | 1987-11-04 | — | — | EP | disclosed |
| EP-0240568-A1 | SILVER HALIDE PHOTOGRAPHIC MATERIAL | KONICA CORPORATION (JP) | 1987-10-14 | — | — | EP | disclosed |
| US-4675275-A | COLORFAST MAGENTA COUPLERS | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1987-06-23 | — | — | US | disclosed |
| EP-0206461-A2 | Silver halide photographic light-sensitive material | KONICA CORPORATION (JP) | 1986-12-30 | — | — | EP | disclosed |
| EP-0187521-A2 | Light-sensitive silver halide photographic material | KONICA CORPORATION (JP) | 1986-07-16 | — | — | EP | disclosed |
| US-4540653-A | METAL COMPLEX, ANILINO COUPLER | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1985-09-10 | — | — | US | disclosed |
| EP-0137271-A2 | Method of improving the light resistance of a dye image | KONICA CORPORATION (JP) | 1985-04-17 | — | — | EP | disclosed |