⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL455036 | 1.00 | — | — | |
| SCHEMBL8979258 | 0.88 | — | — | |
| SCHEMBL7738883 | 0.88 | — | — | |
| SCHEMBL8977871 | 0.79 | THRB (0.32) | — | |
| SCHEMBL10585575 | 0.79 | — | — | |
| SCHEMBL7510455 | 0.79 | — | — | |
| SCHEMBL29263768 | 0.75 | THRB (0.39) | — | |
| SCHEMBL8979212 | 0.74 | THRB (0.33) | — | |
| SCHEMBL451219 | 0.74 | — | — | |
| SCHEMBL81953 | 0.72 | MAPT (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20020160256-A1 | Non-aqueous electrolyte secondary battery | DENSO CORPORATION (JP) | 2002-10-31 | — | — | US | claimed |
| US-9650451-B2 | Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-05-16 | — | — | US | disclosed |
| US-9604891-B2 | Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-03-28 | — | — | US | disclosed |
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-20150361026-A1 | Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-17 | — | — | US | disclosed |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20140171584-A1 | Fluorine-Containing Compounds and Their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-06-19 | — | — | US | disclosed |
| US-8691491-B2 | Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-04-08 | — | — | US | disclosed |
| US-8663903-B2 | Top coating composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-20130216960-A1 | Water Repellent Additive for Immersion Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-08-22 | — | — | US | disclosed |
| US-20050250898-A1 | Top coat composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2005-11-10 | — | — | US | disclosed |
| US-6858760-B2 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2005-02-22 | — | — | US | disclosed |
| US-20040236046-A1 | Fluorine-containing polymerisable monomer and polymer prepared by using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2004-11-25 | — | — | US | disclosed |
| US-20040225159-A1 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | CENTRAL GLASS COMPANY, LTD. (JP) | 2004-11-11 | — | — | US | disclosed |
| US-20040192867-A1 | Fluorine-containing compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers, dissolution inhibitors, and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2004-09-30 | — | — | US | disclosed |
| US-6784312-B2 | TO PRODUCE POLYMERS THAT HAVE HIGH TRANSPARENCY IN A WIDE WAVELENGTH REGION FROM VACUUM; IMPROVED ADHESION TO THE SUBSTRATE, AND IMPROVED FILM FORMING PROPERTY; REFLECTION PREVENTIVE MATERIAL, OPTICAL DEVICE MATERIAL OR RESIST | CENTRAL GLASS COMPANY, LIMITED (JP) | 2004-08-31 | — | — | US | disclosed |
| US-20040106755-A1 | Fluorine containing compounds with unsaturated ether or ester groups | CENTRAL GLASS COMPANY, LIMITED (JP) | 2004-06-03 | — | — | US | disclosed |
| US-20030232940-A1 | Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2003-12-18 | — | — | US | disclosed |
| US-20030078352-A1 | Fluorine-containing polymerisable monomer and polymer prepared by using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2003-04-24 | — | — | US | disclosed |
| US-20020160256-A1 | Non-aqueous electrolyte secondary battery | DENSO CORPORATION (JP) | 2002-10-31 | — | — | US | disclosed |