SCHEMBL451219

SCHEMBL451219

CCC(F)C(F)(F)C(F)(F)C(C(=O)O)=C(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8979258 0.86
SCHEMBL7738883 0.86
SCHEMBL9744926 0.81
SCHEMBL450275 0.79
SCHEMBL251044 0.74
SCHEMBL455036 0.74
SCHEMBL455673 0.74
SCHEMBL7783408 0.73
SCHEMBL29263772 0.71 THRB (0.41)
SCHEMBL1801444 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100316806-A1 ANTI-FROST COATING AND THE APPLICATION METHOD THEREOF INSTITUTE OF CHEMISTRY, CHINESE ACADEMY OF SCIENCES (CN) 2010-12-16 US claimed
EP-2236573-A1 AN ANTI-FROST COATING AND THE APPLICATION METHOD THEREOF Institute of Chemistry, Chinese Academy of Science (CN) 2010-10-06 EP claimed
EP-4302753-A1 MICROPARTICLES AND MICROPARTICLE DISPERSION The University of Tokyo (JP) 2024-01-10 EP disclosed
US-20230404065-A1 MICROPARTICLES AND MICROPARTICLE DISPERSION THE UNIVERSITY OF TOKYO (JP) 2023-12-21 US disclosed
US-9650451-B2 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions CENTRAL GLASS COMPANY, LIMITED (JP) 2017-05-16 US disclosed
US-9604891-B2 Methods for producing fluorine-containing hydroxyaldehyde, fluorine-containing propanediol, and fluorine-containing alcohol monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2017-03-28 US disclosed
US-9488914-B2 Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2016-11-08 US disclosed
US-20150361026-A1 Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer CENTRAL GLASS COMPANY, LIMITED (JP) 2015-12-17 US disclosed
US-20150198879-A1 Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2015-07-16 US disclosed
US-20140171584-A1 Fluorine-Containing Compounds and Their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions CENTRAL GLASS COMPANY, LIMITED (JP) 2014-06-19 US disclosed
US-8691491-B2 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions CENTRAL GLASS COMPANY, LIMITED (JP) 2014-04-08 US disclosed
US-20040192867-A1 Fluorine-containing compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers, dissolution inhibitors, and resist compositions CENTRAL GLASS COMPANY, LIMITED (JP) 2004-09-30 US disclosed
US-6784312-B2 TO PRODUCE POLYMERS THAT HAVE HIGH TRANSPARENCY IN A WIDE WAVELENGTH REGION FROM VACUUM; IMPROVED ADHESION TO THE SUBSTRATE, AND IMPROVED FILM FORMING PROPERTY; REFLECTION PREVENTIVE MATERIAL, OPTICAL DEVICE MATERIAL OR RESIST CENTRAL GLASS COMPANY, LIMITED (JP) 2004-08-31 US disclosed
US-20040106755-A1 Fluorine containing compounds with unsaturated ether or ester groups CENTRAL GLASS COMPANY, LIMITED (JP) 2004-06-03 US disclosed
US-20030232940-A1 Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same CENTRAL GLASS COMPANY, LIMITED (JP) 2003-12-18 US disclosed
US-20030078352-A1 Fluorine-containing polymerisable monomer and polymer prepared by using same CENTRAL GLASS COMPANY, LIMITED (JP) 2003-04-24 US disclosed
EP-0541395-B1 Coating agents TAKEMOTO OIL & FAT CO LTD (JP) 1996-05-08 EP disclosed
US-5501904-A POLYSILOXANE-VINYL GRAFT POLYMER TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) 1996-03-26 US disclosed
US-5405691-A Polysiloxane-polyvinyl graft copolymer TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) 1995-04-11 US disclosed
EP-0541395-A1 Coating agents Takemoto Yushi Kabushiki Kaisha (JP) 1993-05-12 EP disclosed