⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL169502 | 0.78 | TSHR (0.45) | — | |
| SCHEMBL6907733 | 0.77 | — | — | |
| SCHEMBL84532 | 0.77 | — | — | |
| Hydrochloric Acid SCHEMBL1235588 | 0.76 | TSHR (0.44) | — | |
| SCHEMBL6883981 | 0.75 | — | — | |
| SCHEMBL84277 | 0.70 | — | — | |
| SCHEMBL10082543 | 0.69 | — | — | |
| SCHEMBL35771 | 0.67 | — | — | |
| SCHEMBL11132938 | 0.67 | — | — | |
| SCHEMBL1490013 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8211613-B2 | prints, color filters, electronics, layer insulation films, wire covering films, optics, circuits, antireflection films, holograms and construction materials comprising a cured mixture of photosensitive resins and photoiniitiators having a naphthalimide structure | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| US-7528205-B2 | Photo radical generator, photo sensitive resin composition and article | DAI NIPPON PRINTING CO., LTD. (JP) | 2009-05-05 | — | — | US | disclosed |
| US-20080275154-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | SAKAYORI KATSUYA | 2008-11-06 | — | — | US | disclosed |
| US-7410746-B2 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-08-12 | — | — | US | disclosed |
| US-20050119432-A1 | Photo radical generator, photo sensitive resin composition and article | DAI NIPPON PRINTING CO., LTD. (JP) | 2005-06-02 | — | — | US | disclosed |
| US-20040023159-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-02-05 | — | — | US | disclosed |