SCHEMBL455762

SCHEMBL455762

CCc1cc[c]c(C)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8902334 0.83 ESR1 (0.38)
SCHEMBL1637751 0.82 CNR1 (0.41)
SCHEMBL1741603 0.80 SKP2 (0.48)
SCHEMBL9838600 0.79
SCHEMBL1663658 0.79
SCHEMBL28283318 0.79
SCHEMBL15067982 0.78 TRPA1 (0.39)
SCHEMBL6885851 0.77 SKP2 (0.46)
SCHEMBL9812632 0.77 EGFR (0.35)
SCHEMBL311359 0.76 TRPA1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 335 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2008077141-A1 RUBBER EPOXY CURATIVES AND METHODS FOR USE THEREOF DESIGNER MOLECULES, INC. (US) 2008-06-26 WO claimed
EP-1199310-B1 PROCESS FOR THE PREPARATION OF CONDENSED PHOSPHORIC ESTERS DAIHACHI CHEM IND (JP) 2003-11-05 EP claimed
US-4567197-A THORMBOXANE A2 ANTAGONISTS IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1986-01-28 US claimed
CN-114303096-A Film-forming composition for lithography, resist pattern formation method, circuit pattern formation method, and purification method 三菱瓦斯化学株式会社 2022-04-08 CN disclosed
WO-2021039843-A1 COMPOSITION FOR FORMING FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD AND PURIFICATION METHOD 三菱瓦斯化学株式会社 2021-03-04 WO disclosed
US-20210003921-A1 COMPOUND, RESIN, COMPOSITION, AND FILM FORMING MATERIAL FOR LITHOGRAPHY USING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-01-07 US disclosed
EP-3760611-A1 COMPOUND, RESIN, COMPOSITION AND FILM-FORMING MATERIAL FOR LITHOGRAPHY USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-01-06 EP disclosed
EP-2841429-B1 TETRAZOLINONE COMPOUNDS AND ITS USE AS PESTICIDES SUMITOMO CHEMICAL CO (JP) 2020-10-21 EP disclosed
CN-111788176-A Compound, resin, composition, and film-forming material for lithography using same 三菱瓦斯化学株式会社 2020-10-16 CN disclosed
US-20200172470-A1 NOVEL (POLY)AMINE COMPOUND, RESIN AND CURED PRODUCT MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-06-04 US disclosed
EP-3659996-A1 NOVEL (POLY)AMINE COMPOUND, RESIN, AND CURED PRODUCT Mitsubishi Gas Chemical Company, Inc. (JP) 2020-06-03 EP disclosed
US-4028419-A PROSTAGLANDINS THE UPJOIN COMPANY (US) 1977-06-07 US disclosed
US-4028350-A ANTIINFLAMMATORY AGENTS THE UPJOHN COMPANY (US) 1977-06-07 US disclosed
US-4026909-A PROSTAGLANDINS THE UPJOHN COMPANY (US) 1977-05-31 US disclosed
US-4018803-A 13,14-Didehydro-PG3 compounds THE UPJOHN COMPANY (US) 1977-04-19 US disclosed
US-4016184-A PROSTAGLANDINS, BLOOD PLATELET AGGREGATION INHIBITORS THE UPJOHN COMPANY (US) 1977-04-05 US disclosed
US-4013695-A PROSTAGLANDINS, HYPOTENSIVES, OXYTOCICS, ANTISECRETORY AND ANTIULCER AGENTS, REPRODUCTION CONTROL THE UPJOHN COMPANY (US) 1977-03-22 US disclosed
US-4001300-A ANTIULCER, DECONGESTANT, LABOR INDUCER, WOUND HEALER THE UPJOHN COMPANY (US) 1977-01-04 US disclosed
US-3974146-A Cyanolpoxy intermediates for prostaglandins and process for preparing same THE UPJOHN COMPANY (US) 1976-08-10 US disclosed
US-3931279-A 5-Oxa prostaglandin F2.sub.α analogs THE UPJOHN COMPANY (US) 1976-01-06 US disclosed