Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.64 |
| ▸ | TSHR | P16473 | 8/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.36 |
| ▸ | PKM | P14618 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.34 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 6/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.34 |
| ▸ | HPGD | P15428 | 4/20 | 0.34 |
| ▸ | TP53 | P04637 | 2/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3430807 | 0.85 | TDP1 (0.63) | TDP1TSHRCYP3A4NPSR1PKM | |
| SCHEMBL5873282 | 0.83 | TDP1 (0.61) | TDP1TSHRCYP3A4NPSR1PKM | |
| SCHEMBL15894556 | 0.82 | TDP1 (0.62) | TDP1TSHRCYP3A4NPSR1PKM | |
| SCHEMBL19296598 | 0.82 | TDP1 (0.67) | TDP1TSHRCYP3A4NPSR1PKM | |
| SCHEMBL11124203 | 0.82 | TSHR (0.49) | TDP1TSHRCYP3A4NPSR1PKM | |
| SCHEMBL28933218 | 0.82 | TDP1 (0.43) | TDP1TSHRMAPK1ALDH1A1MEN1 | |
| SCHEMBL8063306 | 0.81 | TDP1 (0.59) | TDP1TSHRCYP3A4NPSR1PKM | |
| Di(Hydroxyethyl)Ether SCHEMBL28176854 | 0.81 | TDP1 (0.47) | TDP1TSHRCYP3A4NPSR1PKM | |
| SCHEMBL12079632 | 0.81 | TSHR (0.47) | TDP1TSHRCYP3A4NPSR1PKM | |
| SCHEMBL28176853 | 0.81 | TSHR (0.47) | TDP1TSHRCYP3A4NPSR1PKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4058505-B1 | SIDE CHAIN FUNCTIONALIZED ORGANOSILOXANE POLYMERS, COATING COMPOSITIONS AND ICE-PHOBIC COATINGS THEREOF | ADAPTIVE SURFACE TECH INC (US) | 2023-05-24 | — | — | EP | disclosed |
| US-11543749-B2 | Resist composition and method for producing resist pattern, and method for producing plated molded article | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-03 | — | — | US | disclosed |
| US-20210278765-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-09-09 | — | — | US | disclosed |
| CN-113296357-A | Resist composition, method for producing resist pattern, and method for producing plated molded article | 住友化学株式会社 | 2021-08-24 | — | — | CN | disclosed |
| CN-107870516-A | Positive photosensitive resin composition, patterned film and method for manufacturing bump | 奇美实业股份有限公司 | 2018-04-03 | — | — | CN | disclosed |
| CN-102213918-B | Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor | JSR CORP | 2014-07-16 | — | — | CN | disclosed |
| CN-102221781-A | Positive radiation sensitive composition, interlayer insulation film and forming method thereof | JSR CORP | 2011-10-19 | — | — | CN | disclosed |
| CN-102213918-A | Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor | JSR CORP | 2011-10-12 | — | — | CN | disclosed |
| US-20090288855-A1 | POSITIVE-TYPE RADIATION-SENSITIVE RESIN COMPOSITION FOR PRODUCING A METAL-PLATING FORMED MATERIAL, TRANSCRIPTION FILM AND PRODUCTION METHOD OF A METAL-PLATING FORMED MATERIAL | JSR CORPORATION (JP) | 2009-11-26 | — | — | US | disclosed |
| EP-1826612-A1 | Radiation-sensitive positive resin composition for producing platings, transfer film, and process for producing platings | JSR Corporation (JP) | 2007-08-29 | — | — | EP | disclosed |
| EP-0704765-B1 | A photoresist composition comprising a polyfunctional vinyl ether compound | SUMITOMO CHEMICAL CO (JP) | 1999-04-21 | — | — | EP | disclosed |
| US-5719008-A | PHOTOLITHOGRAPHY, COLOR FILTERS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-02-17 | — | — | US | disclosed |
| US-5672463-A | NEGATIVE WORKING PHOTORESIST RESIN COMPOSITION COMPRISING POLYFUNCTIONAL VINYL ETHER COMPOUND, CATIONIC PHOTOPOLYMERIZATION INITIATOR, SOLVENT | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1997-09-30 | — | — | US | disclosed |
| EP-0611784-B1 | Polyfunctional vinyl ether compounds and photoresist resin compositions containing them | SUMITOMO CHEMICAL CO (JP) | 1997-05-07 | — | — | EP | disclosed |
| US-5510540-A | FOR SENSITIVE, HIGH RESOLUTION, RAPID HARDENING PHOTORESISTS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1996-04-23 | — | — | US | disclosed |
| EP-0704765-A1 | A photoresist composition comprising a polyfunctional vinyl ether compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1996-04-03 | — | — | EP | disclosed |
| EP-0517923-B1 | METHOD OF FORMING MINUTE RESIST PATTERN | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1995-10-04 | — | — | EP | disclosed |
| EP-0611784-A1 | Polyfunctional vinyl ether compounds and photoresist resin compositions containing them | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1994-08-24 | — | — | EP | disclosed |
| US-5340702-A | Method of forming fine resist pattern | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-08-23 | — | — | US | disclosed |
| EP-0517923-A1 | METHOD OF FORMING MINUTE RESIST PATTERN | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-12-16 | — | — | EP | disclosed |