SCHEMBL456099

SCHEMBL456099

Brc1c[c]cc2ccccc12

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 6/20 0.38
▸ CYP2A6 P11509 5/20 0.38
▸ HSD17B10 Q99714 4/20 0.38
▸ TSHR P16473 2/20 0.38
▸ TDP1 Q9NUW8 1/20 0.38
▸ CYP1A2 P05177 4/20 0.36
▸ POLB P06746 1/20 0.35
▸ HPRT1 P00492 1/20 0.35
▸ NQO2 P16083 1/20 0.32
▸ CYP2C9 P11712 1/20 0.32
▸ CYP2C19 P33261 1/20 0.32
▸ HPGD P15428 2/20 0.32
▸ HIF1A Q16665 1/20 0.32
▸ CYP1B1 Q16678 1/20 0.32
▸ THRB P10828 1/20 0.32
▸ ALOX12 P18054 1/20 0.32
▸ CYP3A4 P08684 1/20 0.31
▸ KEAP1 Q14145 1/20 0.31
▸ CA1 P00915 1/20 0.30
▸ CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4474923 0.73 CYP1A2 (0.54) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL7598766 0.73 CYP2A6 (0.38) ALDH1A1CYP2A6TDP1
SCHEMBL146326 0.73 BACE1 (0.34) CA9
SCHEMBL457506 0.71 ALDH1A1 (0.38) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL148866 0.71 CYP2A6 (0.52) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL455474 0.71 CYP2A6 (0.52) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL2252185 0.71 ALDH1A1 (0.52) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL455834 0.71 HPRT1 (0.39) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL69629 0.69 ALDH1A1 (0.53) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL29903148 0.69 ALDH1A1 (0.53) ALDH1A1CYP2A6HSD17B10TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 121 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5338640-A Alkali-developable; resistance to oxygen etching; multilayer photoresists; photolithographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 1994-08-16 — — US claimed
US-5278273-A Additional polymer FUJI PHOTO FILM CO., LTD. (JP) 1994-01-11 — — US claimed
US-5276124-A Ladder polymers, photoresists, lithographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 1994-01-04 — — US claimed
US-5252686-A Siloxane polymers and positive working light-sensitive compositions comprising the same FUJI PHOTO FILM CO., LTD. (JP) 1993-10-12 — — US claimed
US-5216105-A SILICONE POLYMERS AND POSITIVE WORKING LIGHT-SENSITIVE COMPOSITIONS COMPRISING THE SAME FUJI PHOTO FILM CO., LTD. (JP) 1993-06-01 — — US claimed
US-4772534-A PHOTORESISTS FUJI PHOTO FILM CO., LTD. (JP) 1988-09-20 — — US claimed
CN-114591319-B Tetrahydropyridopyrimidine derivative and application thereof 江苏先声药业有限公司 2024-06-28 — — CN disclosed
EP-4365180-A1 RARE EARTH COMPLEX Tosoh Corporation (JP) 2024-05-08 — — EP disclosed
WO-2023282236-A1 RARE EARTH COMPLEX 東ソー株式会社 2023-01-12 — — WO disclosed
CN-114591319-A Tetrahydropyridopyrimidine derivative and application thereof 江苏先声药业有限公司 2022-06-07 — — CN disclosed
EP-3908283-A1 KRAS G12C INHIBITORS Mirati Therapeutics, Inc. (US) 2021-11-17 — — EP disclosed
EP-2841429-B1 TETRAZOLINONE COMPOUNDS AND ITS USE AS PESTICIDES SUMITOMO CHEMICAL CO (JP) 2020-10-21 — — EP disclosed
WO-2020146613-A1 KRAS G12C INHIBITORS Mirati Therapeutics, Inc. (US) 2020-07-16 — — WO disclosed
EP-0363198-A2 Positive working photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1990-04-11 — — EP disclosed
EP-0360618-A2 Light-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1990-03-28 — — EP disclosed
CN-1040029-A Carboxylic acid amide compounds and preparation method thereof and contain the pharmaceutical composition of this carboxylic acid amine compound OTSUKA PHARMA CO LTD (JP) 1990-02-28 — — CN disclosed
US-4772534-A PHOTORESISTS FUJI PHOTO FILM CO., LTD. (JP) 1988-09-20 — — US disclosed
US-4736065-A Pesticides NATIONAL RESEARCH DEVELOPMENT CORPORATION (GB) 1988-04-05 — — US disclosed
US-4701399-A Photosensitive composition with 2-halomethyl-5-substituted-1,3,4-oxadiazole FUJI PHOTO FILM CO., LTD. (JP) 1987-10-20 — — US disclosed
EP-0115156-A2 Light sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1984-08-08 — — EP disclosed
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