SCHEMBL4575366

SCHEMBL4575366

CC(C)CCCCC(=O)CCCCC(C)C

nearest known ligand 0.52

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KDM4C Q9H3R0 2/20 0.47
KDM4A O75164 1/20 0.47
PHF8 Q9UPP1 1/20 0.47
KDM2A Q9Y2K7 1/20 0.47
CA1 P00915 2/20 0.46
LMNA P02545 1/20 0.46
BLM P54132 1/20 0.43
MAPT P10636 1/20 0.41
KMT2A Q03164 1/20 0.41
LTA4H P09960 1/20 0.39
GSTK1 Q9Y2Q3 2/20 0.38
DEGS1 O15121 1/20 0.38
KDM1A O60341 1/20 0.37
ENPEP Q07075 1/20 0.37
FFAR4 Q5NUL3 1/20 0.35
FFAR1 O14842 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8836038 0.97 KDM4C (0.50) KDM4CKDM4APHF8KDM2ACA1
SCHEMBL28995086 0.97 KDM4C (0.50) KDM4CKDM4APHF8KDM2ACA1
SCHEMBL28399899 0.97 KDM4C (0.50) KDM4CKDM4APHF8KDM2ACA1
SCHEMBL31300438 0.97 KDM4C (0.50) KDM4CKDM4APHF8KDM2ACA1
SCHEMBL8039193 0.97 KDM4C (0.50) KDM4CKDM4APHF8KDM2ACA1
SCHEMBL17228593 0.97 KDM4C (0.46) KDM4CKDM4APHF8KDM2ACA1
SCHEMBL28393903 0.97 KDM4C (0.50) KDM4CKDM4APHF8KDM2ACA1
SCHEMBL10335747 0.95 CA1 (0.48) KDM4CKDM4APHF8KDM2ACA1
SCHEMBL5613242 0.92 CA1 (0.48) KDM4CKDM4APHF8KDM2ACA1
SCHEMBL7900855 0.89 ALDH1A1 (0.43) KDM4CKDM4APHF8KDM2ACA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080244963-A1 Lead-Free Aviation Fuel TOTAL FRANCE (FR) 2008-10-09 US claimed
US-4318837-A BLEND OF SATURATED POLYESTER, UNDATURATED POLYESTER AND POLYISOCYANATE THE GOODYEAR TIRE & RUBBER COMPANY (US) 1982-03-09 US claimed
US-12306538-B2 Treatment liquid and pattern forming method FUJIFILM CORPORATION (JP) 2025-05-20 US disclosed
US-11453734-B2 Treatment liquid and pattern forming method FUJIFILM CORPORATION (JP) 2022-09-27 US disclosed
US-20220244629-A1 METHOD FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2022-08-04 US disclosed
US-20210200097-A1 TREATMENT LIQUID AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2021-07-01 US disclosed
US-10962884-B2 Treatment liquid and pattern forming method FUJIFILM CORPORATION (JP) 2021-03-30 US disclosed
CN-111133086-A Compositions comprising odorants 丝趣科尔卡有限公司 2020-05-08 CN disclosed
US-20190258168-A1 TREATMENT LIQUID AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2019-08-22 US disclosed
US-20180217503-A1 TREATMENT LIQUID AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2018-08-02 US disclosed
US-20080244963-A1 Lead-Free Aviation Fuel TOTAL FRANCE (FR) 2008-10-09 US disclosed
US-7084090-B2 Catalyst comprised of n-substituted cyclic imides and processes for preparing organic compounds with the catalyst DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2006-08-01 US disclosed
US-20040053778-A1 Catalyst comprised of n-substituted cyclic imides and processes for preparing organic compounds with the catalyst DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2004-03-18 US disclosed