Fluoride

Fluoride

SCHEMBL4577949

CCCCN(CCCC)c1cccc2c1N2.F

nearest known ligand 0.37

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CRHR1 P34998 3/20 0.33
ELANE P08246 3/20 0.33
UTS2R Q9UKP6 1/20 0.33
MEN1 O00255 1/20 0.32
MAPT P10636 1/20 0.32
HTT P42858 1/20 0.32
KMT2A Q03164 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
OPRM1 P35372 2/20 0.31
OPRL1 P41146 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
KDM4E B2RXH2 1/20 0.30
LMNA P02545 1/20 0.30
CHRM2 P08172 1/20 0.30
CYP3A4 P08684 1/20 0.30
HTR1A P08908 1/20 0.30
ADRA2A P08913 1/20 0.30
CYP2D6 P10635 1/20 0.30
CYP2C9 P11712 1/20 0.30
DRD2 P14416 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5501861 0.87 KCNH2 (0.39) OPRM1DRD2DRD3OPRK1KCNH2
SCHEMBL15229630 0.81 NOX1 (0.43) MEN1MAPTHTTKMT2ANPSR1
Iodide SCHEMBL16343943 0.79 NOX1 (0.42) MEN1MAPTHTTKMT2ANPSR1
Iodide SCHEMBL16343688 0.79 NOX1 (0.42) MEN1MAPTHTTKMT2ANPSR1
SCHEMBL7153352 0.75 TDP1 (0.44) CRHR1ELANEUTS2RMEN1MAPT
Fluoride SCHEMBL3362188 0.72 CRHR1 (0.33) CRHR1ELANEUTS2R
SCHEMBL1509318 0.71 KDM4E (0.48) CRHR1ELANEUTS2RMAPTTDP1
SCHEMBL9419764 0.70 TDP1 (0.40) CRHR1ELANEUTS2RMEN1MAPT
SCHEMBL1509343 0.69 KDM4E (0.43) CRHR1ELANEMAPTTDP1KDM4E
Fluoride SCHEMBL4383957 0.69 MEN1 (0.34) CRHR1MEN1MAPTKMT2ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230375930-A1 PHOTOSENSITIVE RESIN MULTILAYER BODY ASAHI KASEI KABUSHIKI KAISHA (JP) 2023-11-23 US disclosed
WO-2021095784-A1 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN MULTILAYER BODY 旭化成株式会社 2021-05-20 WO disclosed
US-7399569-B2 Method for producing microcapsules, microcapsules, recording material, and heat-sensitive recording material FUJIFILM CORPORATION (JP) 2008-07-15 US disclosed
US-7157407-B2 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed
US-20050187102-A1 Method for producing microcapsules, microcapsules, recording material, and heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2005-08-25 US disclosed
US-20050158548-A1 Microcapsule, manufacturing method thereof and recording material FUJI PHOTO FILM CO., LTD. 2005-07-21 US disclosed
US-20050032642-A1 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2005-02-10 US disclosed
US-20050032643-A1 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2005-02-10 US disclosed
US-6830861-B2 Photosensitivity; sharp images; high contrast FUJI PHOTO FILM CO., LTD. (JP) 2004-12-14 US disclosed
US-20020142244-A1 Photopolymerizable composition and recording material FUJI PHOTO FILM CO., LTD. 2002-10-03 US disclosed