2-Methoxyethanol

2-Methoxyethanol

SCHEMBL4579796

C=CC.C=CC.CCC(=O)OCCOC.COCCO

nearest known ligand 0.40

Full drug profile on Sugi Atlas →

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.40
TSHR P16473 6/20 0.38
MGLL Q99685 1/20 0.33
GAA P10253 1/20 0.33
DGKA P23743 1/20 0.32
HPGD P15428 2/20 0.32
HTT P42858 1/20 0.31
ALDH1A1 P00352 4/20 0.31
HIF1A Q16665 3/20 0.31
TP53 P04637 2/20 0.31
HSD17B10 Q99714 1/20 0.31
KDM4E B2RXH2 1/20 0.30
THRB P10828 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP2C19 P33261 1/20 0.30
BLM P54132 1/20 0.30
WRN Q14191 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propene SCHEMBL143194 0.93 NAAA (0.45) NAAATSHRGAADGKAHPGD
Propionic Acid SCHEMBL7662132 0.87 NAAA (0.41) NAAATSHRGAADGKAHPGD
Propene SCHEMBL1464836 0.87 TSHR (0.50) NAAATSHRMGLLGAADGKA
Propene SCHEMBL6062165 0.84 NAAA (0.52) NAAATSHRGAADGKAHPGD
Propene SCHEMBL181618 0.84 NAAA (0.52) NAAATSHRGAADGKAHPGD
SCHEMBL181426 0.82
2-Methoxyethanol SCHEMBL109126 0.81 TSHR (0.41) TSHRGAAHTTALDH1A1HIF1A
Butanone SCHEMBL3296764 0.81 ALDH1A1 (0.42) TSHRGAAHPGDALDH1A1
Hydrochloric Acid SCHEMBL29367851 0.80 NAAA (0.52) NAAATSHRGAADGKAHPGD
Ammonia Solution, Strong SCHEMBL27732610 0.80 NAAA (0.52) NAAATSHRGAADGKAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7425404-B2 Chemical amplification resist composition and pattern-forming method using the same FUJIFILM CORPORATION (JP) 2008-09-16 US disclosed
US-7291441-B2 Positive resist composition and pattern forming method utilizing the same FUJIFILM CORPORATION (JP) 2007-11-06 US disclosed
US-20060046190-A1 Positive resist composition and pattern forming method utilizing the same FUJI PHOTO FILM CO., LTD. 2006-03-02 US disclosed
US-20060040208-A1 Chemical amplification resist composition and pattern-forming method using the same FUJI PHOTO FILM CO., LTD. 2006-02-23 US disclosed