SCHEMBL4580087

SCHEMBL4580087

C=C(C)C(=O)OCCOc1ccc(O)cc1

nearest known ligand 0.60

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.60
APEX1 P27695 1/20 0.60
HTT P42858 1/20 0.60
TDP1 Q9NUW8 1/20 0.60
THRB P10828 2/20 0.47
LTA4H P09960 3/20 0.46
NR5A1 Q13285 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.43
TSHR P16473 2/20 0.42
GAA P10253 1/20 0.42
MAPT P10636 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL454606 0.93 POLB (0.67) POLBAPEX1HTTTDP1THRB
SCHEMBL11372567 0.92 POLB (0.67) POLBAPEX1HTTTDP1LTA4H
SCHEMBL11169479 0.92 HTT (0.71) POLBAPEX1HTTTDP1LTA4H
SCHEMBL11168834 0.90 HTT (0.74) POLBAPEX1HTTTDP1LTA4H
SCHEMBL11172057 0.90 HTT (0.74) POLBAPEX1HTTTDP1LTA4H
SCHEMBL5229243 0.90 POLB (0.51) POLBAPEX1HTTTDP1THRB
SCHEMBL4447276 0.88 POLB (0.61) POLBAPEX1HTTTDP1THRB
SCHEMBL14173271 0.88 POLB (0.61) POLBAPEX1HTTTDP1THRB
SCHEMBL11053172 0.88 POLB (0.61) POLBAPEX1HTTTDP1THRB
SCHEMBL24565142 0.87 POLB (0.60) POLBAPEX1HTTTDP1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230213862-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-07-06 US disclosed
US-20230205087-A1 PHOTORESIST UNDERLAYER COMPOSITION DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2023-06-29 US disclosed
US-20230057401-A1 COATED UNDERLAYER FOR OVERCOATED PHOTORESIST U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-02-23 US disclosed
US-20220397827-A1 COMPOSITION FOR PHOTORESIST UNDERLAYER U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2022-12-15 US disclosed
US-20220019143-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2022-01-20 US disclosed
US-10377692-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2019-08-13 US disclosed
EP-3495397-A1 (METH)ACRYLIC COMPOSITION, COATING MATERIAL CONTAINING SAME AND CURED BODY Mitsubishi Gas Chemical Company, Inc. (JP) 2019-06-12 EP disclosed
US-8623590-B2 Pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-01-07 US disclosed
US-8623590-B2 Pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-01-07 US disclosed
US-20120108043-A1 PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
US-6137563-A Apparatus for recording images FUJI PHOTO FILM CO., LTD. (JP) 2000-10-24 US disclosed
US-6077649-A Heat developing method and apparatus for heat development FUJI PHOTO FILM CO., LTD. (JP) 2000-06-20 US disclosed
US-6022664-A MIXTURE OF A POLYMERIZABLE VINYL MONOMER AND ORGANIC BORATE COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 2000-02-08 US disclosed
EP-0899613-A1 Heat processing apparatus and heat developing apparatus using the same Fuji Photo Film Co., Ltd. (JP) 1999-03-03 EP disclosed
EP-0412570-B1 Light- and heat-sensitive recording material FUJI PHOTO FILM CO LTD (JP) 1996-07-10 EP disclosed
US-5376495-A Microcapsules from solution containing component capable of undergoing color development or achromatization and volatile solvent FUJI PHOTO FILM CO., LTD. (JP) 1994-12-27 US disclosed
US-5091280-A Photothermography; microencapsulated leuco dyes, polymerizable vinyl monomer, photoinitiator electron acceptive developer FUJI PHOTO FILM CO., LTD. (JP) 1992-02-25 US disclosed
EP-0007574-B1 LIQUID-CRYSTALLINE POLYMERIC PHASE WITH A CHOLESTERIC STRUCTURE, METHOD FOR ITS PREPARATION AND ITS USE BASF Aktiengesellschaft (DE) 1983-05-25 EP disclosed
US-4293435-A ACRYLATE POLYMERS BASF AKTIENGESELLSCHAFT (DE) 1981-10-06 US disclosed
EP-0007574-A1 Liquid-crystalline polymeric phase with a cholesteric structure, method for its preparation and its use BASF Aktiengesellschaft (DE) 1980-02-06 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10377692-B2 Photoresist composition C1R, C1S, F12 POLB 2261/4885APEX1 308/4885HTT 656/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.