⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14935747 | 1.00 | — | — | |
| SCHEMBL14912856 | 1.00 | — | — | |
| SCHEMBL5667893 | 1.00 | — | — | |
| SCHEMBL9126113 | 0.83 | PAOX (0.38) | — | |
| SCHEMBL9614821 | 0.74 | POLB (0.30) | — | |
| SCHEMBL6202483 | 0.74 | ADRA1A (0.50) | — | |
| SCHEMBL7186679 | 0.74 | ADRA1A (0.50) | — | |
| SCHEMBL7289421 | 0.74 | ADRA1A (0.50) | — | |
| SCHEMBL7286381 | 0.72 | ADRA1A (0.47) | — | |
| SCHEMBL8959106 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7326516-B2 | Resist composition for immersion exposure and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2008-02-05 | — | — | US | disclosed |
| US-20050186503-A1 | Resist composition for immersion exposure and pattern formation method using the same | FUJI PHOTO FILM CO., LTD. | 2005-08-25 | — | — | US | disclosed |