SCHEMBL4580888

SCHEMBL4580888

C=Cc1ccc(C(C)OC)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.48
TRPA1 O75762 1/20 0.37
TSHR P16473 1/20 0.37
HDAC8 Q9BY41 1/20 0.37
TAS1R3 Q7RTX0 2/20 0.36
TAS1R1 Q7RTX1 2/20 0.36
TYR P14679 1/20 0.35
AKR1C2 P52895 1/20 0.34
AKR1C1 Q04828 1/20 0.34
TDP1 Q9NUW8 2/20 0.33
CHRNB2 P17787 1/20 0.33
CHRNB4 P30926 1/20 0.33
CHRNA3 P32297 1/20 0.33
CHRNA7 P36544 1/20 0.33
CHRNA4 P43681 1/20 0.33
PTGS2 P35354 2/20 0.33
TP53 P04637 1/20 0.30
NFE2L2 Q16236 1/20 0.30
CYP3A4 P08684 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29162670 0.84 ALDH1A1 (0.50) ALDH1A1TRPA1TSHRHDAC8TAS1R3
SCHEMBL1338710 0.81 AKR1C2 (0.42) ALDH1A1TSHRTYRAKR1C2AKR1C1
SCHEMBL3287560 0.80 ALDH1A1 (0.50) ALDH1A1TRPA1TSHRHDAC8TAS1R3
SCHEMBL1151204 0.78 ALDH1A1 (0.42) ALDH1A1TRPA1TSHRHDAC8TAS1R3
SCHEMBL1140933 0.77 ALDH1A1 (0.58) ALDH1A1TRPA1TSHRHDAC8TAS1R3
SCHEMBL6281528 0.77 ALDH1A1 (0.58) ALDH1A1TRPA1TSHRHDAC8TAS1R3
SCHEMBL367595 0.77 TYR (0.58) ALDH1A1TSHRHDAC8TYRTDP1
SCHEMBL1647492 0.77 ALDH1A1 (0.58) ALDH1A1TRPA1TSHRHDAC8TAS1R3
SCHEMBL4518522 0.77 AKR1C2 (0.38) AKR1C2AKR1C1
SCHEMBL7862299 0.76 TP53 (0.47) ALDH1A1TRPA1TSHRHDAC8TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1319981-B1 Positive resist composition FUJIFILM CORP (JP) 2012-10-24 EP disclosed
EP-1969083-B1 ORGANIC LIGHT-EMITTING DEVICE SHOWA DENKO KK (JP) 2010-02-10 EP disclosed
US-7335454-B2 Positive resist composition FUJIFILM CORPORATION (JP) 2008-02-26 US disclosed
US-20030194650-A1 Fluorine group- containing resin, which is substituted with a group that is decomposed by the action of an acid to increase solubility in an alkali developer; and an acid generator capable of generating an acid upon irradiation FUJI PHOTO FILM CO., LTD. 2003-10-16 US disclosed
EP-1319981-A2 Positive resist composition FUJI PHOTO FILM CO., LTD. (JP) 2003-06-18 EP disclosed
US-6299785-B1 Electrode formation process JSR CORPORATION (JP) 2001-10-09 US disclosed
US-4935559-A Palladium catalyst EASTMAN KODAK COMPANY (US) 1990-06-19 US disclosed