SCHEMBL458103

SCHEMBL458103

Fc1cc(F)cc(S)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19254402 0.92
SCHEMBL20350246 0.78
SCHEMBL459344 0.78
SCHEMBL16425741 0.78
SCHEMBL9000952 0.78
SCHEMBL13836490 0.78
SCHEMBL449836 0.78
SCHEMBL1498504 0.74 RXRA (0.36)
SCHEMBL17160975 0.74 CES2 (0.30)
SCHEMBL28455177 0.74 CA12 (0.57)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 372 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119855060-B PCB (printed circuit board) ink-jet printing pretreatment agent, preparation method thereof and PCB ink-jet printing method 深圳市板明科技股份有限公司 2025-06-17 CN claimed
CN-119855060-A PCB (printed circuit board) ink-jet printing pretreatment agent, preparation method thereof and PCB ink-jet printing method 深圳市板明科技股份有限公司 2025-04-18 CN claimed
CN-109311662-A The nano structural material in nucleocapsid plasma nano gap 南洋理工大学 2019-02-05 CN claimed
WO-2017164822-A1 CORE-SHELL PLASMONIC NANOGAPPED NANOSTRUCTURED MATERIAL NANYANG TECHNOLOGICAL UNIVERSITY (SG) 2017-09-28 WO claimed
US-5290911-A Forming polymers by catalytic oxidative coupling RESEARCH INSTITUTE FOR PRODUCTION DEVELOPMENT (JP) 1994-03-01 US claimed
US-4282246-A Antidiabetic furancarboxylic and thiphenecarboxylic acids PFIZER INC. (US) 1981-08-04 US claimed
CN-119855060-B PCB (printed circuit board) ink-jet printing pretreatment agent, preparation method thereof and PCB ink-jet printing method 深圳市板明科技股份有限公司 2025-06-17 CN disclosed
US-20250189895-A1 METHOD OF MANUFACTURING PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2025-06-12 US disclosed
US-20250172872-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2025-05-29 US disclosed
CN-119855060-A PCB (printed circuit board) ink-jet printing pretreatment agent, preparation method thereof and PCB ink-jet printing method 深圳市板明科技股份有限公司 2025-04-18 CN disclosed
CN-119684179-A Diaryl ether compound and preparation method and application thereof 沈阳农业大学 2025-03-25 CN disclosed
CN-119620544-A Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article 东京应化工业株式会社 2025-03-14 CN disclosed
CN-118994182-A Seleno-, thio-or oxo-narcotine derivatives, their synthesis and their use in tumour therapy 华东理工大学 2024-11-22 CN disclosed
US-5290911-A Forming polymers by catalytic oxidative coupling RESEARCH INSTITUTE FOR PRODUCTION DEVELOPMENT (JP) 1994-03-01 US disclosed
US-5153305-A From diaryl disulfide; mild conditions using organometallic catalyst RESEARCH INSTITUTE FOR PRODUCTION DEVELOPMENT (JP) 1992-10-06 US disclosed
US-4983720-A Process for preparing a polyarylene thioether IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1991-01-08 US disclosed
EP-0402481-A1 PRODUCTION OF POLYARYLENE THIOETHER RESEARCH INSTITUTE FOR PRODUCTION DEVELOPMENT (JP) 1990-12-19 EP disclosed
US-4931542-A Process for preparing a polyarylene thioether IDEMITSU PETROCHEMICAL COMPANY, LIMITED (JP) 1990-06-05 US disclosed
EP-0281036-A2 A process for preparing a polyarylene thioether IDEMITSU PETROCHEMICAL CO. LTD. (JP) 1988-09-07 EP disclosed
US-4282246-A Antidiabetic furancarboxylic and thiphenecarboxylic acids PFIZER INC. (US) 1981-08-04 US disclosed