⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1323210 | 0.81 | CA2 (0.32) | — | |
| SCHEMBL510219 | 0.75 | — | — | |
| SCHEMBL515809 | 0.73 | — | — | |
| SCHEMBL7360964 | 0.73 | — | — | |
| SCHEMBL7575245 | 0.73 | — | — | |
| SCHEMBL5690632 | 0.72 | — | — | |
| SCHEMBL509933 | 0.72 | — | — | |
| SCHEMBL16005391 | 0.70 | MEN1 (0.48) | — | |
| SCHEMBL28455706 | 0.70 | MEN1 (0.48) | — | |
| SCHEMBL3816736 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1888735-A1 | COPPER PASSIVATING POST-CHEMICAL MECHANICAL POLISHING CLEANING COMPOSITION AND METHOD OF USE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2008-02-20 | — | — | EP | claimed |
| WO-2006127885-A1 | COPPER PASSIVATING POST-CHEMICAL MECHANICAL POLISHING CLEANING COMPOSITION AND METHOD OF USE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2006-11-30 | — | — | WO | claimed |
| CN-107108633-A | The Imidazopyridazine derivative connected as the heterocyclic radical of PI3K beta inhibitors | 詹森药业有限公司 | 2017-08-29 | — | — | CN | disclosed |