SCHEMBL4581152

SCHEMBL4581152

NC(=O)c1ccc(CCO)c(C(N)=O)c1CCO

nearest known ligand 0.33

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
SIRT1 Q96EB6 1/20 0.33
BCAT2 O15382 1/20 0.32
KDM4E B2RXH2 1/20 0.31
ALDH1A1 P00352 1/20 0.31
MAPT P10636 1/20 0.31
HPGD P15428 1/20 0.31
TSHR P16473 1/20 0.31
HSD17B10 Q99714 1/20 0.31
KMT2A Q03164 1/20 0.30
ATM Q13315 1/20 0.30
SIRT3 Q9NTG7 1/20 0.30
TDP1 Q9NUW8 1/20 0.30
DGAT1 O75907 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7109139 0.82 SIRT1 (0.39) SIRT1BCAT2KDM4EALDH1A1MAPT
SCHEMBL29421066 0.82 SIRT1 (0.39) SIRT1BCAT2KDM4EALDH1A1MAPT
SCHEMBL2206844 0.81 PRKCI (0.40) SIRT1KDM4EALDH1A1MAPTHPGD
SCHEMBL16094935 0.81 FOLH1 (0.40)
Hydrochloric Acid SCHEMBL3352601 0.79 PRKCI (0.39) SIRT1KDM4EALDH1A1MAPTHPGD
Hydrochloric Acid SCHEMBL3355963 0.79 PRKCI (0.39) SIRT1KDM4EALDH1A1MAPTHPGD
SCHEMBL9340012 0.78 DHODH (0.32) SIRT3TDP1DGAT1
SCHEMBL1083196 0.77 HRH1 (0.32) SIRT3TDP1DGAT1
Acetic Acid SCHEMBL6139766 0.77 PRKCI (0.41) ALDH1A1MAPTHSD17B10KMT2A
SCHEMBL5251042 0.77 TSHR (0.37) KDM4EMAPTTSHRKMT2ASIRT3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1418047-B1 Planographic printing plate precursor FUJIFILM CORP (JP) 2008-06-11 EP disclosed
US-7358032-B2 Alloy supports having recording multilayers including water insoluble and alkaline soluble polyurethanes, development inhibitors and light to heat conversion dyes, having durability and chemical resistance FUJIFILM CORPORATION (JP) 2008-04-15 US disclosed
US-20070122743-A1 comprising supports having recording layer including multilayers containing water-insoluble and alkali-soluble resin containing infrared absorbers, development inhibitors that exhibiting enhanced solubility in an aqueous alkali solution through light exposure FUJI PHOTO FILM CO., LTD. 2007-05-31 US disclosed
US-20040101780-A1 Alloy supports having recording multilayers including water insoluble and alkaline soluble polyurethanes, development inhibitors and light to heat conversion dyes, having durability and chemical resistance FUJI PHOTO FILM CO., LTD. 2004-05-27 US disclosed
EP-1418047-A2 Planographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2004-05-12 EP disclosed