⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14954961 | 0.81 | — | — | |
| SCHEMBL977275 | 0.80 | — | — | |
| SCHEMBL975650 | 0.75 | — | — | |
| SCHEMBL3621813 | 0.70 | — | — | |
| SCHEMBL975258 | 0.69 | — | — | |
| SCHEMBL6233416 | 0.68 | — | — | |
| SCHEMBL32671322 | 0.66 | HSD17B10 (0.31) | — | |
| SCHEMBL977221 | 0.64 | THRB (0.33) | — | |
| SCHEMBL704490 | 0.64 | — | — | |
| SCHEMBL706568 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8268403-B2 | Curing a coating of a siloxane compound and a carbosilane compound using ultraviolet radiation; a low relative dielectric constant, excellent chemical resistance, plasma resistance, mechanical strength | JSR CORPORATION (JP) | 2012-09-18 | — | — | US | disclosed |
| US-20080268264-A1 | Method for Forming Organic Silica Film, Organic Silica Film, Wiring Structure, Semiconductor Device, and Composition for Film Formation | JSR CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |