SCHEMBL977221

SCHEMBL977221

CCOC(OCC)[SiH2]C[Si](OCC)(OCC)OCC

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.33
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7135804 0.84 THRB (0.32) THRBLMNA
SCHEMBL183067 0.80
SCHEMBL3623773 0.78 THRB (0.35) THRBLMNA
SCHEMBL5170992 0.77
SCHEMBL977275 0.76
SCHEMBL16732337 0.76
SCHEMBL31690721 0.73 THRB (0.31) THRB
SCHEMBL975258 0.73
SCHEMBL332697 0.71 THRB (0.42) THRBLMNA
SCHEMBL632455 0.71 THRB (0.42) THRBLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 208 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250304819-A1 Flexible and foldable abrasion resistant photopatternable siloxane hard coat OPTITUNE OY (FI) 2025-10-02 US claimed
CN-107636097-B Silicone polymer composition and use thereof 奥普提汀公司 2024-03-15 CN claimed
US-11634610-B2 Siloxane polymer compositions and their use OPTITUNE OY (FI) 2023-04-25 US claimed
US-20220010172-A1 SILOXANE POLYMER COMPOSITIONS AND THEIR USE OPTITUNE OY (FI) 2022-01-13 US claimed
US-11127864-B2 Carbosiloxane polymer compositions, methods of producing the same and the use thereof OPTITUNE OY (FI) 2021-09-21 US claimed
CN-107636844-B Composition, device containing the composition, method for manufacturing the same, and method for improving battery efficiency 欧提腾股份有限公司 2021-05-28 CN claimed
US-20210087429-A1 Flexible and foldable abrasion resistant photopatternable siloxane hard coat OPTITUNE OY (FI) 2021-03-25 US claimed
EP-3775075-A1 FLEXIBLE AND FOLDABLE ABRASION RESISTANT PHOTOPATTERNABLE SILOXANE HARD COAT Optitune Oy (FI) 2021-02-17 EP claimed
CN-112236493-A Flexible and foldable abrasion resistant photopatternable silicone hardcoats 欧提腾股份有限公司 2021-01-15 CN claimed
WO-2019193258-A1 FLEXIBLE AND FOLDABLE ABRASION RESISTANT PHOTOPATTERNABLE SILOXANE HARD COAT OPTITUNE OY (FI) 2019-10-10 WO claimed
US-20180277691-A1 Novel carbosiloxane polymer compositions, methods of producing the same and the use thereof OPTITUNE OY (FI) 2018-09-27 US claimed
US-20180066159-A1 SILOXANE POLYMER COMPOSITIONS AND THEIR USE BASF SE (DE) 2018-03-08 US claimed
EP-3271433-A1 NOVEL SILOXANE POLYMER COMPOSITIONS AND THEIR USE BASF SE (DE) 2018-01-24 EP claimed
WO-2016146896-A1 NOVEL SILOXANE POLYMER COMPOSITIONS AND THEIR USE OPTITUNE OY (FI) 2016-09-22 WO claimed
US-7932295-B2 Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device JSR CORPORATION (JP) 2011-04-26 US claimed
US-7875317-B2 formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors JSR CORPORATION (JP) 2011-01-25 US claimed
US-20080246153-A1 ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE JSR CORPORATION (JP) 2008-10-09 US claimed
US-7399715-B2 Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device JSR CORPORATION (JP) 2008-07-15 US claimed
US-12351733-B2 Flexible and foldable abrasion resistant photopatternable siloxane hard coat OPTITUNE OY (FI) 2025-07-08 US disclosed
EP-1088868-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-04 EP disclosed