SCHEMBL4585859

SCHEMBL4585859

Cc1ccc(/C=C/c2ccc(/C=C/c3ccccc3)cc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NFE2L2 Q16236 6/20 0.61
MAOB P27338 2/20 0.56
CYP19A1 P11511 1/20 0.56
MAOA P21397 1/20 0.56
RELA Q04206 2/20 0.56
TRPA1 O75762 1/20 0.56
CYP1B1 Q16678 1/20 0.55
ALDH1A1 P00352 1/20 0.55
CYP3A4 P08684 1/20 0.55
MAPT P10636 1/20 0.55
HPGD P15428 1/20 0.55
FGF23 Q9GZV9 1/20 0.53
LMNA P02545 1/20 0.53
TSHR P16473 1/20 0.53
ALOX12 P18054 1/20 0.53
ACHE P22303 1/20 0.53
CHAT P28329 1/20 0.52
ALOX5 P09917 2/20 0.52
PTGS1 P23219 2/20 0.52
PTGS2 P35354 2/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4585867 1.00 NFE2L2 (0.61) NFE2L2MAOBCYP19A1MAOARELA
SCHEMBL840358 1.00 NFE2L2 (0.61) NFE2L2MAOBCYP19A1MAOARELA
SCHEMBL1239547 1.00 NFE2L2 (0.61) NFE2L2MAOBCYP19A1MAOARELA
SCHEMBL700269 1.00 NFE2L2 (0.61) NFE2L2MAOBCYP19A1MAOARELA
SCHEMBL7164327 1.00 NFE2L2 (0.61) NFE2L2MAOBCYP19A1MAOARELA
SCHEMBL4585865 1.00 NFE2L2 (0.61) NFE2L2MAOBCYP19A1MAOARELA
(Z)-1,2-Diphenylethene SCHEMBL10630770 0.92 TSHR (0.65) NFE2L2MAOBCYP19A1MAOARELA
(Z)-1,2-Diphenylethene SCHEMBL10630776 0.92 TSHR (0.65) NFE2L2MAOBCYP19A1MAOARELA
SCHEMBL7164325 0.91 NFE2L2 (0.68) NFE2L2MAOBCYP19A1MAOARELA
SCHEMBL7164332 0.91 NFE2L2 (0.68) NFE2L2MAOBCYP19A1MAOARELA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220404702-A1 PAG-FREE POSITIVE CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHODS OF USING THE SAME MERCK PATENT GMBH (DE) 2022-12-22 US disclosed
US-20220019141-A1 POSITIVE WORKING PHOTOSENSITIVE MATERIAL MERCK PATENT GMBH (DE) 2022-01-20 US disclosed
US-20210382390-A1 NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST MERCK PERFORMANCE MATERIALS GERMANY GMBH (DE) 2021-12-09 US disclosed
US-20200319555-A1 NEGATIVE RESIST FORMULATION FOR PRODUCING UNDERCUT PATTERN PROFILES MERCK PATENT GMBH (DE) 2020-10-08 US disclosed
US-20080042129-A1 Organic Thin Film Transistor and Its Fabrication Method SHARP KABUSHIKI KAISHA (JP) 2008-02-21 US disclosed
CN-1753935-A Functional organic thin film, organic thin-film transistor, pi-electron conjugated molecule-containing silicon compound, and methods of forming them SHARP KK (JP) 2006-03-29 CN disclosed
EP-1598387-A1 FUNCTIONAL ORGANIC THIN FILM, ORGANIC THIN-FILM TRANSISTOR, PI-ELECTRON CONJUGATED MOLECULE-CONTAINING SILICON COMPOUND, AND METHODS OF FORMING THEM Sharp Kabushiki Kaisha (JP) 2005-11-23 EP disclosed