SCHEMBL4591741

SCHEMBL4591741

O=S(=O)(O)c1cccc(-n2nnnc2S)c1.[Na]

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 5/20 0.43
MAPT P10636 3/20 0.43
TP53 P04637 3/20 0.43
ALDH1A1 P00352 7/20 0.42
SMN1; SMN2 Q16637 4/20 0.42
HTT P42858 3/20 0.42
S1PR4 O95977 2/20 0.42
HPGD P15428 2/20 0.42
S1PR1 P21453 2/20 0.42
RAB9A P51151 2/20 0.42
KMT2A Q03164 2/20 0.42
NPSR1 Q6W5P4 2/20 0.42
HSD17B10 Q99714 3/20 0.40
TSHR P16473 2/20 0.40
TDP1 Q9NUW8 1/20 0.40
GAA P10253 1/20 0.39
L3MBTL1 Q9Y468 3/20 0.38
MAPK1 P28482 1/20 0.38
POLB P06746 1/20 0.36
PKM P14618 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31457351 1.00 LMNA (0.43) LMNAMAPTTP53ALDH1A1SMN1; SMN2
SCHEMBL278418 1.00 LMNA (0.43) LMNAMAPTTP53ALDH1A1SMN1; SMN2
SCHEMBL29672419 1.00 LMNA (0.43) LMNAMAPTTP53ALDH1A1SMN1; SMN2
SCHEMBL1156164 0.99 LMNA (0.43) LMNAMAPTTP53ALDH1A1SMN1; SMN2
Water SCHEMBL29823030 0.99 LMNA (0.43) LMNAMAPTTP53ALDH1A1SMN1; SMN2
SCHEMBL29218112 0.92 LMNA (0.39) LMNAMAPTTP53ALDH1A1SMN1; SMN2
SCHEMBL14498650 0.85 LMNA (0.54) LMNAMAPTTP53ALDH1A1SMN1; SMN2
SCHEMBL8740829 0.85 LMNA (0.43) LMNAMAPTTP53ALDH1A1SMN1; SMN2
SCHEMBL30632057 0.84 LMNA (0.43) LMNAMAPTTP53ALDH1A1SMN1; SMN2
SCHEMBL29218109 0.84 ALDH1A1 (0.44) LMNAMAPTTP53ALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11939691-B2 Tin or tin alloy electroplating bath, and electronic component having electrodeposit formed thereon using the plating bath ISHIHARA CHEMICAL CO., LTD. (JP) 2024-03-26 US disclosed
CN-117015845-A Composition for cleaning semiconductor substrate and cleaning method 三菱瓦斯化学株式会社 2023-11-07 CN disclosed
US-11797141-B2 Touch sensor member precursor, and method for manufacturing touch sensor member FUJIFILM CORPORATION (JP) 2023-10-24 US disclosed
US-11541455-B2 Gold-coated flat silver particles, gold-coated flat silver particle dispersion, method of manufacturing gold-coated flat silver particles, coating film, and antireflection optical member FUJIFILM CORPORATION (JP) 2023-01-03 US disclosed
WO-2022191051-A1 COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND CLEANING METHOD 三菱瓦斯化学株式会社 2022-09-15 WO disclosed
US-20220253181-A1 TOUCH SENSOR MEMBER PRECURSOR, AND METHOD FOR MANUFACTURING TOUCH SENSOR MEMBER FUJIFILM CORPORATION (JP) 2022-08-11 US disclosed
EP-3425012-B1 INK COMPOSITION, INK SET, IMAGE FORMATION METHOD, AND PRINTED MATTER FUJIFILM CORP (JP) 2022-08-03 EP disclosed
CN-110366461-B Gold-coated silver flat particles, gold-coated silver flat particle dispersion, method for producing same, coating film, and antireflection optical member 富士胶片株式会社 2021-12-21 CN disclosed
CN-110383118-B Resin molded body and blue light cut-off laminate 富士胶片株式会社 2021-11-09 CN disclosed
CN-108699368-B Ink composition and image forming method 富士胶片株式会社 2021-09-14 CN disclosed
EP-0572663-A1 SILVER HALIDE PHOTOGRAPHIC MATERIAL FUJI PHOTO FILM CO., LTD. (JP) 1993-12-08 EP disclosed
US-5244782-A Process for producing silver halide photographic emulsion FUJI PHOTO FILM CO. LTD. (JP) 1993-09-14 US disclosed
EP-0350903-B1 SILVER HALIDE PHOTOGRAPHIC MATERIALS FUJI PHOTO FILM CO., LTD. (JP) 1993-04-21 EP disclosed
EP-0506009-A1 Silver halide photographic material FUJI PHOTO FILM CO., LTD. (JP) 1992-09-30 EP disclosed
US-4923794-A TELLUROETHER COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1990-05-08 US disclosed
EP-0144990-B1 PROCESS FOR PREPARING SILVER HALIDE EMULSION FUJI PHOTO FILM CO., LTD. (JP) 1990-04-25 EP disclosed
EP-0350903-A1 Silver halide photographic materials FUJI PHOTO FILM CO., LTD. (JP) 1990-01-17 EP disclosed
EP-0302528-A2 Process for producing a silver halide photographic material FUJI PHOTO FILM CO., LTD. (JP) 1989-02-08 EP disclosed
US-4665017-A GRAIN GROWTH PROMOTOR AND INHIBITOR FUJI PHOTO FILM CO., LTD. (JP) 1987-05-12 US disclosed
EP-0144990-A2 Process for preparing silver halide emulsion FUJI PHOTO FILM CO., LTD. (JP) 1985-06-19 EP disclosed