Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.42 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.42 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.42 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | GALR3 | O60755 | 1/20 | 0.41 |
| ▸ | BLM | P54132 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Isopropyl Alcohol SCHEMBL28434694 | 0.92 | TSHR (0.45) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL60590 | 0.92 | TSHR (0.48) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL155545 | 0.91 | HSD17B10 (0.42) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| Methyl Alcohol SCHEMBL3842813 | 0.90 | TSHR (0.47) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL251201 | 0.90 | TSHR (0.47) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| Propylene Glycol SCHEMBL17627367 | 0.89 | TSHR (0.40) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| Propylene Glycol SCHEMBL155544 | 0.89 | TSHR (0.40) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| Water SCHEMBL8208129 | 0.88 | TSHR (0.45) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL28080800 | 0.87 | HSD17B10 (0.53) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| Propylene Glycol SCHEMBL5503254 | 0.87 | TSHR (0.39) | TSHRCHRM2CHRM4CHRM1TBXA2R |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3000553-B1 | USE OF BISMUTH OXIDE-BASED ADDITIVE FOR LASER MARKING | TOKAN MATERIAL TECH CO LTD (JP) | 2019-10-02 | — | — | EP | disclosed |
| US-9637651-B2 | Bismuth oxide-based addictive for laser marking | TOKAN MATERIAL TECHNOLOGY CO., LTD. (JP) | 2017-05-02 | — | — | US | disclosed |
| US-20160168399-A1 | BISMUTH OXIDE-BASED ADDICTIVE FOR LASER MARKING | TOKAN MATERIAL TECHNOLOGY CO., LTD. (JP) | 2016-06-16 | — | — | US | disclosed |
| EP-3000553-A1 | BISMUTH OXIDE-BASED ADDITIVE FOR LASER MARKING | Tokan Material Technology Co., Ltd. (JP) | 2016-03-30 | — | — | EP | disclosed |
| US-7425404-B2 | Chemical amplification resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2008-09-16 | — | — | US | disclosed |
| US-7291441-B2 | Positive resist composition and pattern forming method utilizing the same | FUJIFILM CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-20060046190-A1 | Positive resist composition and pattern forming method utilizing the same | FUJI PHOTO FILM CO., LTD. | 2006-03-02 | — | — | US | disclosed |
| US-20060040208-A1 | Chemical amplification resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2006-02-23 | — | — | US | disclosed |