SCHEMBL60590

SCHEMBL60590

CCOCC(C)OC(C)=O

nearest known ligand 0.48

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.48
CHRM2 P08172 1/20 0.48
CHRM4 P08173 1/20 0.48
CHRM1 P11229 1/20 0.48
TBXA2R P21731 1/20 0.48
GALR3 O60755 1/20 0.47
MAPT P10636 1/20 0.47
BLM P54132 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
ALDH1A1 P00352 2/20 0.41
LMNA P02545 1/20 0.39
HSD17B10 Q99714 1/20 0.39
TDP1 Q9NUW8 2/20 0.36
ALOX15 P16050 1/20 0.35
TRPV1 Q8NER1 1/20 0.32
THRB P10828 1/20 0.32
PRKCA P17252 2/20 0.32
FAAH O00519 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methyl Alcohol SCHEMBL3842813 0.98 TSHR (0.47) TSHRCHRM2CHRM4CHRM1TBXA2R
Isopropyl Alcohol SCHEMBL28434694 0.96 TSHR (0.45) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL7160598 0.92 TSHR (0.42) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL4591928 0.92 TSHR (0.42) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL429531 0.92 TSHR (0.42) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL896036 0.92 TSHR (0.42) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL16713206 0.90 TSHR (0.41) TSHRCHRM2CHRM4CHRM1TBXA2R
Propylene Glycol SCHEMBL17627367 0.89 TSHR (0.40) TSHRCHRM2CHRM4CHRM1TBXA2R
Propylene Glycol SCHEMBL155544 0.89 TSHR (0.40) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL2355051 0.88 TSHR (0.54) TSHRCHRM2CHRM4CHRM1TBXA2R

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 28445 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260147279-A1 DEVELOPER COMPOSITION FOR METAL-CONTAINING PHOTORESIST, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING METHOD USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2026-05-28 US claimed
CN-122095033-A Formulations 2026-05-26 CN claimed
WO-2026104328-A1 FORMULATION MERCK PATENT GMBH (DE) 2026-05-21 WO claimed
CN-122060419-A Photovoltaic backboard, preparation method thereof and photovoltaic module 浙江福斯特新材料研究院有限公司 2026-05-19 CN claimed
CN-122050914-A Low-temperature-cured non-silver-based chemically-plated flexible seed layer slurry and preparation method thereof 苏州晶银新材料科技有限公司 2026-05-15 CN claimed
CN-122037616-A Pigment red 254 kneading inducer and application thereof 重庆安尚科技有限公司 2026-05-15 CN claimed
EP-4072992-B1 COMPOSITION SAMSUNG ELECTRONICS CO LTD (KR) 2026-04-08 EP claimed
EP-4720077-A1 ORGANOMETALLIC TIN OXO CARBOXYLATE CLUSTERS WITH MIXED ORGANIC LIGANDS FOR EUV LITHOGRAPHY Merck Patent GmbH (DE) 2026-04-08 EP claimed
US-20260083659-A1 SUNSCREEN COMPOSITIONS AND METHODS OF USE MARY KAY INC. (US) 2026-03-26 US claimed
US-20260042784-A1 ZN-BASED ORGANIC COORDINATION NANOPARTICLE AND PREPARATION METHODTHEREFOR, PHOTORESIST COMPOSITION CONTAINING SAME, AND USE THEREOF BEIJING VFORTUNE NEW ENERGY POWER TECH DEVELOPMENT CO LTD (CN) 2026-02-12 US claimed
EP-0745633-A2 Si containing high molecular compound and photosensitive resin composition NEC CORPORATION (JP) 1996-12-04 EP claimed
EP-0423334-B1 RESIN COMPOSITION AND PROCESS FOR FORMING TRANSPARENT THIN FILM NIPPON KAYAKU KK (JP) 1996-09-18 EP claimed
EP-0639629-A1 Polyimide varnish NISSAN CHEMICAL INDUSTRIES LTD. (JP) 1995-02-22 EP claimed
US-5180794-A Resin compositions and process for forming transparent thin films NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1993-01-19 US claimed
EP-0251952-B1 PROCESS FOR THE PREPARATION OF POLYISOCYANATES HAVING A BIURET STRUCTURE RHONE-POULENC CHIMIE (FR) 1992-09-30 EP claimed
EP-0260994-B1 PROCESS FOR PRODUCING INTEGRATED CIRCUIT JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-07-15 EP claimed
EP-0236497-B1 COATING COMPOSITIONS AND METHOD FOR IMPROVING THE PROPERTIES OF COATED SUBSTRATES COATINGS FOR INDUSTRY, INC. (US) 1991-07-31 EP claimed
EP-0423334-A1 RESIN COMPOSITION AND PROCESS FOR FORMING TRANSPARENT THIN FILM NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1991-04-24 EP claimed
US-4983762-A From aliphatic, alicyclic or arylaliphatic diisocyanate, water, liquid form, carbon dioxide RHONE-POULENC CHIMIE DE BASE (FR) 1991-01-08 US claimed
EP-0260994-A2 Process for producing integrated circuit JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1988-03-23 EP claimed