SCHEMBL4592908

SCHEMBL4592908

CC[SiH2]c1cccc2ccccc12

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 4/20 0.43
ALDH1A1 P00352 3/20 0.43
TSHR P16473 2/20 0.40
HSD17B10 Q99714 2/20 0.40
TDP1 Q9NUW8 1/20 0.40
CYP1A2 P05177 4/20 0.39
CYP2C19 P33261 2/20 0.39
CYP2D6 P10635 1/20 0.39
HPGD P15428 2/20 0.38
CYP3A4 P08684 1/20 0.38
KEAP1 Q14145 1/20 0.38
CYP2C9 P11712 1/20 0.38
HPRT1 P00492 1/20 0.37
KDM4E B2RXH2 1/20 0.36
LMNA P02545 1/20 0.36
HTR1B P28222 1/20 0.36
ELANE P08246 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29416020 1.00 CYP2A6 (0.43) CYP2A6ALDH1A1TSHRHSD17B10TDP1
SCHEMBL29416023 0.83 CYP2A6 (0.40) CYP2A6ALDH1A1TSHRHSD17B10TDP1
SCHEMBL19809434 0.83 CYP2A6 (0.40) CYP2A6ALDH1A1TSHRHSD17B10TDP1
SCHEMBL3951282 0.78 ALDH1A1 (0.39) CYP2A6ALDH1A1TSHRHSD17B10TDP1
SCHEMBL11115232 0.75 ALDH1A1 (0.37) CYP2A6ALDH1A1TSHRHSD17B10TDP1
SCHEMBL4582431 0.75 ALDH1A1 (0.48) CYP2A6ALDH1A1TSHRHSD17B10TDP1
SCHEMBL6831899 0.74 ALDH1A1 (0.50) CYP2A6ALDH1A1TSHRHSD17B10TDP1
SCHEMBL30184794 0.74 ALDH1A1 (0.50) CYP2A6ALDH1A1TSHRHSD17B10TDP1
SCHEMBL15301990 0.74 HPGD (0.40) CYP2A6ALDH1A1TSHRHSD17B10TDP1
SCHEMBL4163126 0.72 TSHR (0.45) CYP2A6ALDH1A1TSHRTDP1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10696845-B2 Energy-sensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 2020-06-30 US disclosed
EP-3275940-B1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2019-12-18 EP disclosed
US-20190225804-A1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2019-07-25 US disclosed
EP-3275940-A1 ENERGY-SENSITIVE RESIN COMPOSITION Tokyo Ohka Kogyo Co., Ltd. (JP) 2018-01-31 EP disclosed
CN-105418926-A Fluorine-containing naphthalene ethyl silicon resin, preparation method and applications thereof SHANGHAI ADVANCED RES INST CAS 2016-03-23 CN disclosed
CN-105418926-A Fluorine-containing naphthalene ethyl silicon resin, preparation method and applications thereof SHANGHAI ADVANCED RES INST CAS 2016-03-23 CN disclosed
US-20120315582-A1 PATTERNED SUBSTRATE AND METHOD FOR PRODUCING SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-12-13 US disclosed
US-20080241484-A1 Patterned Substrate and Method for Producing Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-10-02 US disclosed