SCHEMBL4582431

SCHEMBL4582431

C[SiH2]c1cccc2ccccc12

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.48
CYP2A6 P11509 5/20 0.48
HSD17B10 Q99714 5/20 0.46
TSHR P16473 3/20 0.46
TDP1 Q9NUW8 1/20 0.46
CYP1A2 P05177 8/20 0.42
HPGD P15428 3/20 0.42
CYP3A4 P08684 1/20 0.42
KEAP1 Q14145 1/20 0.42
HPRT1 P00492 1/20 0.42
CYP2C19 P33261 3/20 0.41
CYP2C9 P11712 2/20 0.41
CYP2D6 P10635 1/20 0.39
HIF1A Q16665 1/20 0.39
CYP1B1 Q16678 1/20 0.39
THRB P10828 1/20 0.39
SIGMAR1 Q99720 1/20 0.38
NR4A1 P22736 1/20 0.37
NR4A2 P43354 1/20 0.37
NR4A3 Q92570 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30184794 0.79 ALDH1A1 (0.50) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL6831899 0.79 ALDH1A1 (0.50) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL10516149 0.78 ALDH1A1 (0.40) ALDH1A1CYP2A6HSD17B10TDP1CYP1A2
SCHEMBL8967366 0.75 ALDH1A1 (0.46) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL619741 0.75 CYP1A2 (0.48) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL8967728 0.75 ALDH1A1 (0.46) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL2686125 0.75 CYP1A2 (0.48) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL619740 0.75 ALDH1A1 (0.46) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL781379 0.75 ALDH1A1 (0.43) ALDH1A1CYP2A6HSD17B10TSHRTDP1
SCHEMBL4592908 0.75 CYP2A6 (0.43) ALDH1A1CYP2A6HSD17B10TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1971664-A1 EMITTING MATERIALS AND ORGANIC LIGHT EMITTING DEVICE USING THE SAME LG Chem, Ltd. (KR) 2008-09-24 EP claimed
WO-2007081179-A1 EMITTING MATERIALS AND ORGANIC LIGHT EMITTING DEVICE USING THE SAME LG CHEM. LTD. (KR) 2007-07-19 WO claimed
CN-114874244-B Preparation method of aryl borate or alkyl borate compound 中国科学院兰州化学物理研究所 2023-12-01 CN disclosed
CN-116075368-A Resin composition, cured product, method for producing same, and laminate 三菱化学株式会社 2023-05-05 CN disclosed
CN-110249004-B Polyimide precursor composition 东京应化工业株式会社 2022-07-19 CN disclosed
CN-108389512-B Laminate, flexible device, and method for producing laminate 东京应化工业株式会社 2022-04-15 CN disclosed
CN-108250754-B Silicon-containing resin composition, silicon-containing resin film, silica film, light-emitting display element panel, and light-emitting display device 东京应化工业株式会社 2022-01-25 CN disclosed
CN-107223127-B Method for producing organohalosilanes 美国陶氏有机硅公司 2020-09-11 CN disclosed
CN-107206355-B Method for producing organohalosilanes 美国陶氏有机硅公司 2020-07-07 CN disclosed
US-10696845-B2 Energy-sensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 2020-06-30 US disclosed
EP-3275940-B1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2019-12-18 EP disclosed
US-20190225804-A1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2019-07-25 US disclosed
EP-3275940-A1 ENERGY-SENSITIVE RESIN COMPOSITION Tokyo Ohka Kogyo Co., Ltd. (JP) 2018-01-31 EP disclosed
CN-107223127-A Method for producing organohalosilanes 美国道康宁公司 2017-09-29 CN disclosed
CN-107206355-A The method for preparing organo-halogen-silane 美国道康宁公司 2017-09-26 CN disclosed
US-7785757-B2 Overcoated photoconductors with thiophosphate containing photogenerating layer XEROX CORPORATION (US) 2010-08-31 US disclosed
CN-100559167-C Preparation method to the unimolecular layer polysilane fluorescence sense film of nitro-aromatic sensitivity UNIV SHANXI NORMAL (CN) 2009-11-11 CN disclosed
CN-101055250-A Preparation method of mono-molecule layer polysilane fluorescent sensing film sensitive to nitro-aromatic compounds UNIV SHANXI NORMAL (CN) 2007-10-17 CN disclosed
US-6753401-B1 DEHYDROGENATIVE POLYMERIZATION OF QUINONE AND/OR DIOL WITH TRIHYDROSILANE OR DIHYDROSILANE IN PRESENCE OF PALLADIUM-CONTAINING CATALYST; POLYSILANES NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2004-06-22 US disclosed
EP-1234829-A1 SILICON-CONTAINING POLYMERS National Institute of Advanced Industrial Science and Technology (JP) 2002-08-28 EP disclosed