SCHEMBL4594882

SCHEMBL4594882

O=Cc1c(O)cccc1C(=O)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.50
LIG1 P18858 1/20 0.50
FNTA P49354 1/20 0.49
FNTB P49356 1/20 0.49
GAA P10253 2/20 0.47
KMT2A Q03164 2/20 0.47
MEN1 O00255 1/20 0.47
USP2 O75604 1/20 0.47
KEAP1 Q14145 1/20 0.47
NFE2L2 Q16236 1/20 0.47
MAPT P10636 3/20 0.47
HPGD P15428 4/20 0.46
KDM4E B2RXH2 3/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
CYP3A4 P08684 2/20 0.46
MAOA P21397 1/20 0.45
MAOB P27338 1/20 0.45
ALDH1A1 P00352 4/20 0.45
STS P08842 1/20 0.44
TDP1 Q9NUW8 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7606293 0.82 AKR1C3 (0.50) AKR1C3GAAKMT2AMEN1MAPT
SCHEMBL4985110 0.81 ALDH1A1 (0.56) FNTAFNTBHPGDKDM4ESMN1; SMN2
SCHEMBL29955463 0.81 ALDH1A1 (0.56) FNTAFNTBHPGDKDM4ESMN1; SMN2
SCHEMBL22431477 0.79 FNTA (0.53) LIG1FNTAFNTBGAAKMT2A
SCHEMBL7758708 0.79 MEN1 (0.57) AKR1C3LIG1FNTAFNTBGAA
SCHEMBL36215 0.78 LIG1 (0.76) AKR1C3LIG1GAAKMT2AMEN1
SCHEMBL22129808 0.78 LIG1 (0.76) AKR1C3LIG1GAAKMT2AMEN1
SCHEMBL29390505 0.78 LIG1 (0.76) AKR1C3LIG1GAAKMT2AMEN1
Benzene SCHEMBL6034371 0.78 LIG1 (0.76) AKR1C3LIG1GAAKMT2AMEN1
SCHEMBL27545240 0.78 KMT2A (0.54) AKR1C3GAAKMT2AMEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0843218-B1 Photosensitive composition FUJIFILM CORP (JP) 2008-01-16 EP disclosed
US-6132931-A A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 2000-10-17 US disclosed
US-6110640-A Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-08-29 US disclosed
EP-0843218-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1998-05-20 EP disclosed
EP-0083971-B1 PHOTOSENSITIVE COMPOSITION KONICA CORPORATION (JP) 1987-04-01 EP disclosed
US-4536465-A CONTAINING CARBOXY, OXY, AROMATIC COMPOUND AND ALDEHYDE OR KETONE WITH A NOVOLAK RESIN KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1985-08-20 US disclosed
US-4460674-A GALLIC ACID DERIVATIVES AND NAPOHTHOQUINONES KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1984-07-17 US disclosed
EP-0083971-A2 Photosensitive composition KONICA CORPORATION (JP) 1983-07-20 EP disclosed