SCHEMBL4595649

SCHEMBL4595649

O=C(c1ccccc1)c1ccc2nc3ccc(C(=O)c4ccccc4)cc3c(-c3ccccc3)c2c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.51
GAA P10253 2/20 0.51
NPSR1 Q6W5P4 1/20 0.51
RAB9A P51151 5/20 0.50
ALDH1A1 P00352 5/20 0.50
HPGD P15428 3/20 0.50
SMN1; SMN2 Q16637 3/20 0.50
POLB P06746 2/20 0.50
L3MBTL1 Q9Y468 2/20 0.50
ATM Q13315 1/20 0.50
TDP1 Q9NUW8 1/20 0.50
ABL1 P00519 1/20 0.50
FABP6 P51161 1/20 0.50
KDM4E B2RXH2 3/20 0.49
HTT P42858 1/20 0.49
MEN1 O00255 3/20 0.48
KMT2A Q03164 3/20 0.48
ESR1 P03372 2/20 0.47
ESR2 Q92731 2/20 0.47
NPC1 O15118 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30543769 1.00 MAPT (0.51) MAPTGAANPSR1RAB9AALDH1A1
SCHEMBL4595823 0.84 MAPT (0.50) MAPTGAANPSR1RAB9AALDH1A1
SCHEMBL30543784 0.84 MAPT (0.50) MAPTGAANPSR1RAB9AALDH1A1
SCHEMBL20783673 0.78 MAPT (0.59) MAPTGAANPSR1RAB9AALDH1A1
SCHEMBL10435576 0.77 ALDH1A1 (0.76) MAPTGAANPSR1RAB9AALDH1A1
SCHEMBL6269076 0.76 MAP3K14 (0.46) MAPTGAANPSR1RAB9AALDH1A1
SCHEMBL4596070 0.75 CHEK2 (0.49) MAPTGAARAB9AALDH1A1HPGD
SCHEMBL328561 0.74 AKR1C3 (0.46) MAPTGAANPSR1RAB9AALDH1A1
SCHEMBL23202886 0.74 ALDH1A1 (0.48) MAPTRAB9AALDH1A1HPGDSMN1; SMN2
SCHEMBL30827908 0.74 ALDH1A1 (0.48) MAPTRAB9AALDH1A1HPGDSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111315828-B Composition, cured product, optical filter, and method for producing cured product 株式会社艾迪科 2023-09-29 CN disclosed
CN-112154167-B Composition, cured product, optical filter, and method for producing cured product 株式会社艾迪科 2023-08-22 CN disclosed
CN-110114376-B Curable composition, method for producing cured product, cured product thereof, and adhesive using same 株式会社ADEKA 2022-06-14 CN disclosed
EP-3339331-B1 COMPOSITION ADEKA CORP (JP) 2022-02-16 EP disclosed
CN-108419438-B Coloring composition 株式会社艾迪科 2021-10-01 CN disclosed
CN-112154167-A Composition, cured product, optical filter, and method for producing cured product 株式会社艾迪科 2020-12-29 CN disclosed
CN-111566173-A Coating composition, method for curing the composition, barrier film, and method for producing cured product 株式会社艾迪科 2020-08-21 CN disclosed
WO-2020021969-A1 COMPOSITION, CURED PRODUCT, OPTICAL FILTER, AND PRODUCTION METHOD FOR CURED PRODUCT 株式会社ADEKA 2020-01-30 WO disclosed
EP-1877864-B1 NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF MERCK PATENT GMBH (DE) 2018-09-19 EP disclosed
EP-3339331-A1 COMPOSITION Adeka Corporation (JP) 2018-06-27 EP disclosed
US-7078157-B2 Photosensitive composition and use thereof AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-07-18 US disclosed
EP-1602010-A2 PHOTOSENSITIVE COMPOSITION AND USE THEREOF AZ Electronic Materials USA Corp. (US) 2005-12-07 EP disclosed
WO-2004077153-A2 PHOTOSENSITIVE COMPOSITION AND USE THEREOF AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-09-10 WO disclosed
US-20040175653-A1 Photosensitive composition and use thereof AZ ELECTRONIC MATERIALS USA CORP. 2004-09-09 US disclosed
EP-0374704-B1 Photopolymerisable blend and photopolymerisable recording material containing it MORTON INT INC (US) 1996-03-27 EP disclosed
EP-0374705-B1 Photopolymerisable compounds, photopolymerisable mixtures containing them and photopolymerisable recording material manufactured therefrom HOECHST AG (DE) 1994-09-21 EP disclosed
US-5217845-A 9-Arylacridine as photoinitiator HOECHST AKTIENGESELLSCHAFT (DE) 1993-06-08 US disclosed
US-5200299-A QUINOLINE AND ACRIDINE COMPOUNDS EFFECTIVE AS PHOTOINITIATORS AND CONTAINING POLYMERIZABLE (METH)ACRYLOYL SUBSTITUENTS HOECHST AKTIENGESELLSCHAFT (DE) 1993-04-06 US disclosed
EP-0374704-A2 Photopolymerisable blend and photopolymerisable recording material containing it MORTON INTERNATIONAL, INC. (US) 1990-06-27 EP disclosed
EP-0374705-A2 Photopolymerisable compounds, photopolymerisable mixtures containing them and photopolymerisable recording material manufactured therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1990-06-27 EP disclosed