Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK14 | Q16539 | 1/20 | 0.52 |
| ▸ | PTGS1 | P23219 | 11/20 | 0.50 |
| ▸ | PTGS2 | P35354 | 10/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2782853 | 0.79 | PTGS2 (0.68) | MAPK14PTGS1PTGS2 | |
| SCHEMBL1180608 | 0.77 | PTGS2 (0.69) | MAPK14PTGS1PTGS2 | |
| SCHEMBL7737501 | 0.77 | PTGS2 (0.66) | MAPK14PTGS1PTGS2 | |
| SCHEMBL2133316 | 0.77 | PTGS2 (0.66) | MAPK14PTGS1PTGS2 | |
| SCHEMBL10843937 | 0.77 | MAPK14 (0.79) | MAPK14PTGS1PTGS2 | |
| SCHEMBL1681771 | 0.76 | PTGS2 (0.65) | MAPK14PTGS1PTGS2 | |
| Ammonia Solution, Strong SCHEMBL28994523 | 0.74 | PTGS2 (0.62) | MAPK14PTGS1PTGS2 | |
| SCHEMBL3534558 | 0.73 | MAPK14 (0.79) | MAPK14PTGS1PTGS2 | |
| SCHEMBL1181119 | 0.72 | PTGS2 (0.73) | MAPK14PTGS1PTGS2 | |
| Thiophene SCHEMBL8678681 | 0.70 | PTGS2 (0.57) | MAPK14PTGS1PTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1878067-A1 | POROUS SEMICONDUCTOR LAYER FORMATION MATERIAL | SEIKO EPSON CORPORATION (JP) | 2008-01-16 | — | — | EP | disclosed |
| WO-2006112537-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT, SEMICONDUCTOR ELEMENT, ELECTRONIC DEVICE, AND ELECTRONIC EQUIPMENT | SEIKO EPSON CORPORATION (JP) | 2006-10-26 | — | — | WO | disclosed |
| WO-2006112514-A1 | POROUS SEMICONDUCTOR LAYER FORMATION MATERIAL | SEIKO EPSON CORPORATION (JP) | 2006-10-26 | — | — | WO | disclosed |
| WO-2006043680-A1 | COMPOSITION FOR CONDUCTIVE MATERIALS, CONDUCTIVE MATERIAL, CONDUCTIVE LAYER, ELECTRONIC DEVICE, AND ELECTRONIC EQUIPMENT | SEIKO EPSON CORPORATION (JP) | 2006-04-27 | — | — | WO | disclosed |
| WO-2006025611-A1 | MATERIAL COMPOSITION FOR CONDUCTIVE LAYERS IN ELECTRONIC DEVICES | SEIKO EPSON CORPORATION (JP) | 2006-03-09 | — | — | WO | disclosed |