Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP2 | P08253 | 1/20 | 0.72 |
| ▸ | MMP7 | P09237 | 1/20 | 0.72 |
| ▸ | MMP14 | P50281 | 1/20 | 0.72 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.56 |
| ▸ | HTR6 | P50406 | 1/20 | 0.56 |
| ▸ | POLB | P06746 | 1/20 | 0.53 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.53 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL270706 | 0.92 | MMP2 (0.77) | MMP2MMP7MMP14HSD11B1POLB | |
| Ammonia Solution, Strong SCHEMBL8418478 | 0.90 | MMP2 (0.74) | MMP2MMP7MMP14HSD11B1POLB | |
| SCHEMBL6553421 | 0.90 | MMP2 (0.74) | MMP2MMP7MMP14HSD11B1POLB | |
| SCHEMBL6552547 | 0.90 | MMP2 (0.74) | MMP2MMP7MMP14HSD11B1POLB | |
| Ammonia Solution, Strong SCHEMBL20473391 | 0.90 | MMP2 (0.74) | MMP2MMP7MMP14HSD11B1POLB | |
| SCHEMBL6552246 | 0.90 | MMP2 (0.74) | MMP2MMP7MMP14HSD11B1POLB | |
| SCHEMBL6553661 | 0.90 | MMP2 (0.74) | MMP2MMP7MMP14HSD11B1POLB | |
| Ammonia Solution, Strong SCHEMBL20473392 | 0.90 | MMP2 (0.74) | MMP2MMP7MMP14HSD11B1POLB | |
| SCHEMBL6651299 | 0.85 | ALDH1A1 (0.62) | MMP2MMP7MMP14HSD11B1FFAR1 | |
| SCHEMBL29091331 | 0.84 | MMP2 (1.00) | MMP2MMP7MMP14FFAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0708086-B1 | Bisguanidine salts and a method for releasing a base using the same salts | FUJI PHOTO FILM CO LTD (JP) | 1998-05-20 | — | — | EP | claimed |
| US-5728879-A | HEAT SENSITIVE ELEMENTS FOR RECORDING AND FORMING IMAGES | FUJI PHOTO FILM CO., LTD. (JP) | 1998-03-17 | — | — | US | claimed |
| EP-0708086-A1 | Bisguanidine salts and a method for releasing a base using the same salts | FUJI PHOTO FILM CO., LTD. (JP) | 1996-04-24 | — | — | EP | claimed |
| CN-105739239-A | Photocurable and thermosetting resin composition, dry film, cured material and printed circuit board | 太阳油墨（苏州）有限公司 | 2016-07-06 | — | — | CN | disclosed |
| US-20140238255-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, FLEXOGRAPHIC PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND FLEXOGRAPHIC PRINTING PLATE AND PROCESS FOR MAKING SAME | FUJIFILM CORPORATION (JP) | 2014-08-28 | — | — | US | disclosed |
| US-20140238255-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, FLEXOGRAPHIC PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND FLEXOGRAPHIC PRINTING PLATE AND PROCESS FOR MAKING SAME | FUJIFILM CORPORATION (JP) | 2014-08-28 | — | — | US | disclosed |
| US-7741010-B2 | Polyester, polyurethane, polyether, polyamide, polyurea formed by a monomer containing two imine groups in the back bone and two end groups containing OH, NR2H, COOH, COCL, COOR, NCO and NCS group polymerized with other monomers; a photolatent or heat latent catalyst such as onium compounds, triazines | FUJIFILM CORPORATION (JP) | 2010-06-22 | — | — | US | disclosed |
| US-7741010-B2 | Polyester, polyurethane, polyether, polyamide, polyurea formed by a monomer containing two imine groups in the back bone and two end groups containing OH, NR2H, COOH, COCL, COOR, NCO and NCS group polymerized with other monomers; a photolatent or heat latent catalyst such as onium compounds, triazines | FUJIFILM CORPORATION (JP) | 2010-06-22 | — | — | US | disclosed |
| US-7718343-B2 | Decomposable resin composition and pattern-forming material including the same | FUJIFILM CORPORATION (JP) | 2010-05-18 | — | — | US | disclosed |
| US-7718343-B2 | Decomposable resin composition and pattern-forming material including the same | FUJIFILM CORPORATION (JP) | 2010-05-18 | — | — | US | disclosed |
| US-20080268371-A1 | Polyester, polyurethane, polyether, polyamide, polyurea formed by a monomer containing two imine groups in the back bone and two end groups containing OH, NR2H, COOH, COCL, COOR, NCO and NCS group polymerized with other monomers; a photolatent or heat latent catalyst such as onium compounds, triazines | FUJIFILM CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |
| US-5728879-A | HEAT SENSITIVE ELEMENTS FOR RECORDING AND FORMING IMAGES | FUJI PHOTO FILM CO., LTD. (JP) | 1998-03-17 | — | — | US | disclosed |
| EP-0708086-A1 | Bisguanidine salts and a method for releasing a base using the same salts | FUJI PHOTO FILM CO., LTD. (JP) | 1996-04-24 | — | — | EP | disclosed |
| EP-0708086-A1 | Bisguanidine salts and a method for releasing a base using the same salts | FUJI PHOTO FILM CO., LTD. (JP) | 1996-04-24 | — | — | EP | disclosed |
| EP-0308750-B1 | Base precursor and light-sensitive material containing base precursor | FUJI PHOTO FILM CO LTD (JP) | 1995-12-13 | — | — | EP | disclosed |
| US-4981965-A | DECARBOXYLATION OF SALT | FUJI PHOTO FILM CO., LTD. (JP) | 1991-01-01 | — | — | US | disclosed |
| EP-0143424-B1 | HEAT-DEVELOPABLE LIGHT-SENSITIVE MATERIALS | FUJI PHOTO FILM CO., LTD. (JP) | 1990-06-27 | — | — | EP | disclosed |
| EP-0308750-A1 | Base precursor and light-sensitive material containing base precursor | Fuji Photo Film Co., Ltd. (JP) | 1989-03-29 | — | — | EP | disclosed |
| US-4603103-A | THERMALLY DECOMPOSABLE ORGANIC SILVER SALT ON A SUPPORT | FUJI PHOTO FILM CO., LTD. (JP) | 1986-07-29 | — | — | US | disclosed |
| EP-0143424-A2 | Heat-developable light-sensitive materials | FUJI PHOTO FILM CO., LTD. (JP) | 1985-06-05 | — | — | EP | disclosed |