SCHEMBL459974

SCHEMBL459974

CC(C)C(=O)CC(=O)C(C)C(=O)O

nearest known ligand 0.50

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.36
CYP2D6 P10635 1/20 0.33
CYP2C19 P33261 1/20 0.33
FOLH1 Q04609 2/20 0.32
NAALAD2 Q9Y3Q0 2/20 0.32
ALDH1A1 P00352 1/20 0.32
GABRR1 P24046 2/20 0.32
RNPEP Q9H4A4 1/20 0.32
CYP1A2 P05177 1/20 0.32
SLC7A5 Q01650 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9126041 0.97 TP53 (0.35) TP53CYP2D6CYP2C19FOLH1NAALAD2
SCHEMBL181668 0.83 CYP2D6 (0.36) TP53CYP2D6CYP2C19ALDH1A1
SCHEMBL5143413 0.81 LDHA (0.42) TP53CYP2D6CYP2C19FOLH1NAALAD2
SCHEMBL7142603 0.80 CYP2D6 (0.35) TP53CYP2D6CYP2C19ALDH1A1
SCHEMBL28426602 0.80 CYP2D6 (0.35) TP53CYP2D6CYP2C19ALDH1A1
SCHEMBL9282807 0.80 CYP2D6 (0.35) TP53CYP2D6CYP2C19ALDH1A1
SCHEMBL30534794 0.80 CYP2D6 (0.35) TP53CYP2D6CYP2C19ALDH1A1
SCHEMBL29035552 0.80 CYP2D6 (0.35) TP53CYP2D6CYP2C19ALDH1A1
SCHEMBL28745252 0.80 CYP2D6 (0.35) TP53CYP2D6CYP2C19ALDH1A1
SCHEMBL28708081 0.80 CYP2D6 (0.35) TP53CYP2D6CYP2C19ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250283212-A1 INHERENTLY SELECTIVE THERMAL ATOMIC LAYER DEPOSITION OF COPPER METAL FILMS WAYNE STATE UNIVERSITY (US) 2025-09-11 US claimed
EP-2857427-B1 CATALYST COMPOSITION FOR POLYURETHANE RESIN PRODUCTION AND METHOD FOR PRODUCING POLYURETHANE RESIN USING SAME TOSOH CORP (JP) 2020-01-08 EP claimed
EP-2222756-B1 ROOM-TEMPERATURE VULCANISABLE ORGANOPOLYSILOXANE COMPOUND TO GIVE AN ELASTOMER AND NOVEL ORGANOPOLYSILOXANE POLYCONDENSATION CATALYSTS ELKEM SILICONES FRANCE SAS (FR) 2018-10-17 EP claimed
EP-2857427-A1 CATALYST COMPOSITION FOR POLYURETHANE RESIN PRODUCTION AND METHOD FOR PRODUCING POLYURETHANE RESIN USING SAME Tosoh Corporation (JP) 2015-04-08 EP claimed
US-8461283-B2 Room-temperature vulcanizable organopolysiloxane compound to give an elastomer and novel organopolysiloxane polycondensation catalysts BLUESTAR SILICONES FRANCE SAS (DE) 2013-06-11 US claimed
JP-2011506739-A 2011-03-03 JP claimed
US-20110040034-A1 ROOM-TEMPERATURE VULCANISABLE ORGANOPOLYSILOXANE COMPOUND TO GIVE AN ELASTOMER AND NOVEL ORGANOPOLYSILOXANE POLYCONDENSATION CATALYSTS BLUESTAR SILICONES FRANCE SAS (DE) 2011-02-17 US claimed
EP-2222756-A1 ROOM-TEMPERATURE VULCANISABLE ORGANOPOLYSILOXANE COMPOUND TO GIVE AN ELASTOMER AND NOVEL ORGANOPOLYSILOXANE POLYCONDENSATION CATALYSTS Bluestar Silicones France (FR) 2010-09-01 EP claimed
WO-2009106719-A1 ROOM-TEMPERATURE VULCANISABLE ORGANOPOLYSILOXANE COMPOUND TO GIVE AN ELASTOMER AND NOVEL ORGANOPOLYSILOXANE POLYCONDENSATION CATALYSTS BLUESTAR SILICONES FRANCE (FR) 2009-09-03 WO claimed
EP-1661160-A4 SUPERCRITICAL FLUID-ASSISTED DEPOSITION OF MATERIALS ON SEMICONDUCTOR SUBSTRATES ADVANCED TECH MATERIALS (US) 2008-07-02 EP claimed
US-7119418-B2 Supercritical fluid-assisted deposition of materials on semiconductor substrates ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2006-10-10 US claimed
EP-1661160-A2 SUPERCRITICAL FLUID-ASSISTED DEPOSITION OF MATERIALS ON SEMICONDUCTOR SUBSTRATES Advanced Technology Materials, Inc. (US) 2006-05-31 EP claimed
WO-2005013331-A2 SUPERCRITICAL FLUID-ASSISTED DEPOSITION OF MATERIALS ON SEMICONDUCTOR SUBSTRATES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2005-02-10 WO claimed
US-20040023453-A1 Supercritical fluid-assisted deposition of materials on semiconductor substrates ATMI, INC. 2004-02-05 US claimed
EP-0504706-B1 Heptandionate compounds of alkaline earth metals SOLVAY BARIUM STRONTIUM GMBH (DE) 1995-06-21 EP claimed
JP-5239066-A None JP disclosed
US-20250283212-A1 INHERENTLY SELECTIVE THERMAL ATOMIC LAYER DEPOSITION OF COPPER METAL FILMS WAYNE STATE UNIVERSITY (US) 2025-09-11 US disclosed
US-6046345-A Barium strontium β-diketonates, processes for producing the same and processes for producing barium strontium-containing oxide dielectric films with the use of the same KABUSHIKIKAISHA KOJUNDOKAGAKU KENKYUSHO (JP) 2000-04-04 US disclosed
JP-H05239066-A VAPOR DEPOSITABLE COMPOUND, MIXTURE FOR USE IN MOCVD METHOD, METHOD FOR PREPARATION OF VAPOR DEPOSITABLE COMPOUND, AND METHOD FOR DEPOSITING LAYER CONTAINING ALKALINE EARTH METAL SOLVAY BARIUM STRONTIUM GMBH 1993-09-17 JP disclosed
US-4036605-A CATALYZING OXIDATION OF HYDROCARBONS WITH A B-KETOENOLATE GULF RESEARCH & DEVELOPMENT COMPANY (US) 1977-07-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110040034-A1 ROOM-TEMPERATURE VULCANISABLE ORGANOPOLYSILOXANE COMPOUND TO GIVE AN ELASTOMER AND NOVEL ORGANOPOLYSILOXANE POLYCONDENSATION CATALYSTS COLGALT1, IDUA, ARSA TP53 4152/4885CYP2D6 3460/4885CYP2C19 2621/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.