SCHEMBL4601146

SCHEMBL4601146

C=C(C=S)C(=O)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4829182 0.83 TSHR (0.41)
SCHEMBL6131317 0.79 TSHR (0.52)
SCHEMBL8580014 0.79
SCHEMBL808980 0.79
SCHEMBL5159687 0.79
SCHEMBL14747830 0.77
SCHEMBL9113783 0.76 TSHR (0.45)
SCHEMBL1101388 0.76 CYP3A4 (0.38)
SCHEMBL19924396 0.76 ALDH1A1 (0.45)
SCHEMBL40331 0.74 HCAR2 (0.57)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4201681-B1 INKJET RECORDING METHOD AND INKJET RECORDING DEVICE KONICA MINOLTA INC (JP) 2025-12-10 EP disclosed
US-20240199847-A1 RESIN COMPOSITION AND ELECTRONIC DEVICE KONICA MINOLTA INC (JP) 2024-06-20 US disclosed
US-11920019-B2 Resin composition and electronic device Konica Minolta, Inc. (JP) 2024-03-05 US disclosed
CN-114040946-B Heat curable inkjet ink 柯尼卡美能达株式会社 2023-10-13 CN disclosed
CN-116507497-A Ink jet recording method and ink jet recording apparatus 柯尼卡美能达株式会社 2023-07-28 CN disclosed
EP-4201681-A1 INKJET RECORDING METHOD AND INKJET RECORDING DEVICE KONICA MINOLTA, INC. (JP) 2023-06-28 EP disclosed
CN-112805337-B Resin composition and electronic device 柯尼卡美能达株式会社 2022-10-28 CN disclosed
CN-114040946-A Heat-curable ink-jet ink 柯尼卡美能达株式会社 2022-02-11 CN disclosed
US-20210347964-A1 RESIN COMPOSITION AND ELECTRONIC DEVICE Konica Minolta, Inc. (JP) 2021-11-11 US disclosed
CN-112805337-A Resin composition and electronic device 柯尼卡美能达株式会社 2021-05-14 CN disclosed
US-7462653-B2 Photocurable and thermosetting composition for ink jet system and printed circuit boards made by use thereof TAIYO INK MANUFACTURING CO., LTD. (JP) 2008-12-09 US disclosed
US-20080213692-A1 RADIATION SENSITIVE COMPOSITION, MICROLENS, PROCESS FOR FORMING THE MICROLENS AND USE OF THE MICROLENS JSR CORPORATION (JP) 2008-09-04 US disclosed
US-7374799-B2 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2008-05-20 US disclosed
EP-1624001-B1 PHOTOCURING/THERMOSETTING INKJET COMPOSITION AND PRINTED WIRING BOARD USING SAME TAIYO INK MFG CO LTD (JP) 2008-04-16 EP disclosed
US-20060058412-A1 Monomer having a (meth)acryloyl group and thermosetting functional group; a photoreactive diluent having a weight-average molecular weight of not more than 700; photopolymerization initiator; viscosity of not more than 150 mPa*s at 25 degrees C.; solder resist pattern directly drawn on printed circuit TAIYO INK MFG. CO., LTD. (JP) 2006-03-16 US disclosed
EP-1624001-A1 PHOTOCURING/THERMOSETTING INKJET COMPOSITION AND PRINTED WIRING BOARD USING SAME Taiyo Ink Manufacturing Co. Ltd (JP) 2006-02-08 EP disclosed
US-20050157399-A1 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2005-07-21 US disclosed
EP-1548497-A1 Radiation sensitive composition, microlens, process for forming the microlens and use of the microlens JSR Corporation (JP) 2005-06-29 EP disclosed
EP-0382477-B1 Resin having a high refractive index TOKUYAMA CORP (JP) 1995-04-19 EP disclosed
US-5214116-A Acrylic polymers with thioester group, lenses, optical fibers, optical recording media TOKUYAMA SODA KABUSHIKI KAISHA (JP) 1993-05-25 US disclosed