SCHEMBL4829182

SCHEMBL4829182

C=C(C=S)C(=O)OCCC

nearest known ligand 0.41

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.41
HCAR2 Q8TDS4 1/20 0.39
THRB P10828 1/20 0.38
HPGD P15428 1/20 0.35
ALDH1A1 P00352 5/20 0.34
GAA P10253 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
LMNA P02545 1/20 0.33
ATM Q13315 1/20 0.33
ESR1 P03372 1/20 0.32
CHRM1 P11229 1/20 0.32
SLC6A2 P23975 1/20 0.32
KDR P35968 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6131317 0.88 TSHR (0.52) TSHRHCAR2THRBHPGDALDH1A1
SCHEMBL4601146 0.83
SCHEMBL9113783 0.81 TSHR (0.45) TSHRTHRB
SCHEMBL7567247 0.81 TSHR (0.45) TSHRHCAR2THRBHPGDALDH1A1
SCHEMBL27483339 0.79 THRB (0.31) THRB
SCHEMBL1275669 0.79 CHRM1 (0.47) THRBALDH1A1GAASMN1; SMN2CHRM1
SCHEMBL15312574 0.78 LMNA (0.31) LMNA
SCHEMBL22471936 0.78 HCAR2 (0.42) TSHRHCAR2THRBHPGDALDH1A1
SCHEMBL3233904 0.78
SCHEMBL1433808 0.76 TSHR (0.39) TSHRHCAR2THRBHPGDALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080213692-A1 RADIATION SENSITIVE COMPOSITION, MICROLENS, PROCESS FOR FORMING THE MICROLENS AND USE OF THE MICROLENS JSR CORPORATION (JP) 2008-09-04 US disclosed
US-7374799-B2 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2008-05-20 US disclosed
US-20050157399-A1 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2005-07-21 US disclosed
EP-1548497-A1 Radiation sensitive composition, microlens, process for forming the microlens and use of the microlens JSR Corporation (JP) 2005-06-29 EP disclosed